検索結果13件中 1-13 を表示

  • TAGAWA Yukio ID: 9000001506127

    Fujitsu Laboratories Ltd. (2001年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Scenario of Source/Drain Extension and Halo Engineering for High Performance 50nm SOI-pMOSFET (2001)
  • TAGAWA Yukio ID: 9000002166100

    FUJITSU Ltd. (2004年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Dopant Profile Design Methodology for 65nm Generation via Inverse Modeling (2004)
  • Yukio Tagawa ID: 9000019322529

    Device Technology Department, Semiconductor Technology Development Division, Semiconductor Business Group Consumer Products & Devices Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2010年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Planar Metal–Oxide–Semiconductor Field-Effect Transistors with Raised Source and Drain Extensions Fabricated by In situ Boron-Doped Selective Silicon Epitaxy (2010)
  • Tagawa Yukio ID: 9000019366238

    CiNii収録論文: 1件

    • Correlation Effect on Optical Absorption in One-Dimensional Peierls-Hubbard Systems (1995)
  • Tagawa Yukio ID: 9000019366708

    CiNii収録論文: 1件

    • Optical Absorption Spectra in One-Dimensional Mixed-Valence Complexes Pt-X (X=Cl, Br, I) (1995)
  • Tagawa Yukio ID: 9000019414868

    Device Technology Department, Semiconductor Technology Development Division, Semiconductor Business Group Consumer Products & Devices Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2010年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Novel Damascene Gate Metal–Oxide–Semiconductor Field-Effect Transistors Fabricated by In situ Arsenic- and Boron-Doped Epitaxy (2010)
  • Tagawa Yukio ID: 9000019426919

    CiNii収録論文: 1件

    • Optical Absorption Spectra Associated with Solitons and Polarons in One-Dimensional Mixed-Valence Metal Complexes (1990)
  • Tagawa Yukio ID: 9000019432362

    Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2008年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Tinv Scaling and Gate Leakage Reduction for n-Type Metal Oxide Semiconductor Field Effect Transistor with HfSix/HfO2 Gate Stack by Interfacial Layer Formation Using Ozone–Water-Last Treatment (2008)
  • Tagawa Yukio ID: 9000019471212

    Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2008年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices (2008)
  • Tagawa Yukio ID: 9000254138163

    Department of Material Physics, Faculty of Engineering Science, Osaka University (1990年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Optical Absorption Spectra Associated with Solitons and Polarons in One-Dimensional Mixed-Valence Metal Complexes (1990)
  • Tagawa Yukio ID: 9000258187426

    Department of Material Physics, Faculty of Engineering Science, Osaka University, Machikaneyama–cho 1–3, Toyonaka 560 (1995年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Optical Absorption Spectra in One-Dimensional Mixed-Valence Complexes Pt-X (X=Cl,Br,I). (1995)
  • 田川 幸男 ID: 9000000167805

    株式会社 日本無重量総合研究所 (1996年 CiNii収録論文より)

    CiNii収録論文: 1件

    • 日本無重量総合研究所の運用状況 (1996)
  • 田川 幸雄 ID: 9000021967728

    長崎大学医学部耳鼻咽喉科学教室 (1980年 CiNii収録論文より)

    CiNii収録論文: 1件

    • THE RELATION BETWEEN PNEUMATIZATION OF HUMAN TEMPORAL BONE AND DEVELOPMENT OF THE VESTIBULAR AQUEDUCT (1980)
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