検索結果43件中 1-20 を表示

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  • WAKABAYASHI Hitoshi ID: 9000001496565

    System Devices Research Laboratories, NEC Corporation (2004年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method (2004)
  • WAKABAYASHI Hitoshi ID: 9000003850720

    Graduate School of Comprehensive Human Sciences, University of Tsukuba (2006年 CiNii収録論文より)

    CiNii収録論文: 2件

    • 1-8 Heat Loss and Insulation Changes by Wearing a Thermal Swimsuit during Water Immersion(Proceedings of the 50th Meeting of Japan Society of Physiological Anthropology) : (2004)
    • Insulation and Body Temperature Changes by Wearing a Thermal Swimsuit during Light Water Exercise (Proceedings of the 54th Meeting of Japan Society of Physiological Anthropology) : (2006)
  • WAKABAYASHI Hitoshi ID: 9000003853549

    Faculty of Design, Kyushu University (2008年 CiNii収録論文より)

    CiNii収録論文: 9件

    • 2-23 Influences of Thermal Swimsuit on Cold Sensation, Thermal Comfort and Salivary Cortisol Concentration during Water Immersion(Proceedings of the 51st Meeting of Japan Society of Physiological Anthropology) : (2004)
    • Thermal Insulation and Body Temperature Wearing a Thermal Swimsuit during Water Immersion : (2006)
    • 1-8 Thermal Swimsuits Attenuate Body Temperature Decrement and Cold Sensation of Prepubescent Children in Cool Water Environment(Proceedings of the 55th Meeting of Japan Society of Physiological Anthropology) : (2006)
  • WAKABAYASHI Hitoshi ID: 9000004825524

    Silicon Systems Research Laboratories, NEC Corporation (2002年 CiNii収録論文より)

    CiNii収録論文: 4件

    • Uniform Si-SEG and Ti/SEG-Si Thickness Ratio Control for Ti-Salicided Sub-Quarter-Micron CMOS Devices (1997)
    • Uniform Raised-Salicide Technology for High-Performance CMOS Devices (2002)
    • ELFIN (ELevated Field INsulator) and SEP (S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs (2002)
  • WAKABAYASHI Hitoshi ID: 9000005541151

    New Glass Research Center, Nihon Yamamura Glass Co., Ltd. (1999年 CiNii収録論文より)

    CiNii収録論文: 2件

    • Multilevel Aluminum Dual-Damascene Interconnects (Al-DDI) for Process-Step Reduction in 0.18um-ULSIs (1998)
    • All-Optical Inverter Operating with a 1.5 μm Laser in Erbium-Doped Phosphate Glass (1999)
  • Wakabayashi Hitoshi ID: 9000006886000

    Department of Ergonomics, Kyushu University (2009年 CiNii収録論文より)

    CiNii収録論文: 3件

    • Thermoregulatory responses and mental performance during passive heating in Japanese and Malaysian males (2009)
    • Physiological parameters relevant to peripheral thermal threshold in Malaysian and Japanese males (2009)
    • Warm or Slightly Hot? : Differences in Linguistic Dimensions Describing Perceived Thermal Sensation : (2009)
  • Hitoshi Wakabayashi ID: 9000019322519

    Device Technology Department, Semiconductor Technology Development Division, Semiconductor Business Group Consumer Products & Devices Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2010年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Planar Metal–Oxide–Semiconductor Field-Effect Transistors with Raised Source and Drain Extensions Fabricated by In situ Boron-Doped Selective Silicon Epitaxy (2010)
  • Wakabayashi Hitoshi ID: 9000019335154

    CiNii収録論文: 1件

    • Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method (2005)
  • Wakabayashi Hitoshi ID: 9000019367984

    CiNii収録論文: 1件

    • Multilevel Aluminum Dual-Damascene Interconnects for Process-Step Reduction in 0.18 µm ULSIs (1999)
  • Wakabayashi Hitoshi ID: 9000019414862

    Device Technology Department, Semiconductor Technology Development Division, Semiconductor Business Group Consumer Products & Devices Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2010年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Novel Damascene Gate Metal–Oxide–Semiconductor Field-Effect Transistors Fabricated by In situ Arsenic- and Boron-Doped Epitaxy (2010)
  • Wakabayashi Hitoshi ID: 9000019432355

    Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2008年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Tinv Scaling and Gate Leakage Reduction for n-Type Metal Oxide Semiconductor Field Effect Transistor with HfSix/HfO2 Gate Stack by Interfacial Layer Formation Using Ozone–Water-Last Treatment (2008)
  • Wakabayashi Hitoshi ID: 9000019458459

    CiNii収録論文: 1件

    • Intra-Level Mix-and-Match Lithography Process for Fabricating Sub-100-nm Complementary Metal-Oxide-Semiconductor Devices using the JBX-9300FS Point-Electron-Beam System (2000)
  • Wakabayashi Hitoshi ID: 9000019471203

    Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan (2008年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices (2008)
  • Wakabayashi Hitoshi ID: 9000019497723

    CiNii収録論文: 1件

    • Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure (1993)
  • Wakabayashi Hitoshi ID: 9000019502788

    CiNii収録論文: 1件

    • Dual Metal/High-$k$ Gate-Last Complementary Metal--Oxide--Semiconductor Field-Effect Transistor with SiBN Film and Characteristic Behavior In Sub-1-nm Equivalent Oxide Thickness (2011)
  • WAKABAYASHI Hitoshi ID: 9000242890408

    Tsukuba University (2005年 CiNii収録論文より)

    CiNii収録論文: 1件

    • P-716 Computer Simulation of Whole Body Temperatures and Thermal Physiological Responses in Water Immersion (2005)
  • Wakabayashi Hitoshi ID: 9000242891141

    Department of Ergonomics, Faculty of Design, Kyushu University, Japan (2009年 CiNii収録論文より)

    CiNii収録論文: 1件

    • D-2 Thermoregulatory Responses during Rest, Passive and Active Heating in Malaysian and Japanese Males (2009)
  • Wakabayashi Hitoshi ID: 9000242891638

    Faculty of Design, Kyushu University (2011年 CiNii収録論文より)

    CiNii収録論文: 1件

    • S2-2 Prediction of rectal temperature from measured infrared tympanic temperature in workers wearing impermeable protective clothing in nuclear facilities (2011)
  • Wakabayashi Hitoshi ID: 9000242891763

    Extreme Environments Laboratory, Department of Sport and Exercise Science, University of Portsmouth:Department of Human Science, Faculty of Design, Kyushu University (2011年 CiNii収録論文より)

    CiNii収録論文: 1件

    • O07-3 Oxygen uptake dynamics during cold water immersion: components of the initial metabolic response and subsequent shivering response (2011)
  • Wakabayashi Hitoshi ID: 9000252985569

    Precision and Intelligence Laboratory, Tokyo Institute of Technology (1993年 CiNii収録論文より)

    CiNii収録論文: 1件

    • Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure (1993)
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