Kaneko Satoru
,
Horiuchi Takahiro
,
Yoshida Kentaro [他]
,
Tanaka Satomi
,
Kato Chihiro
,
Kano Makoto
,
Kumagai Masao
,
Tanoue Hideto
,
Kamiya Masao
,
Takikawa Hirofumi
… The deposition methods include sputtering, electron cyclotron resonance chemical vapor deposition (ECR-CVD), plasma enhanced chemical vapor deposition (PECVD), arc ion plating (Arc), filtered arc deposition (FAD), and plasma-based ion implantation (PBII). …
Jpn J Appl Phys 50(1), 01AF11-01AF11-3, 2011-01-25
応用物理学会