Search Results:　 1-20 of 11906

1

Simple Synthesis of Platinum Nanoparticles by Plasma Sputtering in Water

Hu Xiulan , Takai Osamu , Saito Nagahiro

… We applied a novel method of plasma sputtering in water for simple and fast preparation of carbon-supported platinum nanoparticles at atmospheric pressure from platinum wire electrodes without using any stabilizers, chemical reductant, plasma-generating gas, or salt solution in an open system. … Upon plasma sputtering, special waveforms of voltage and current were obtained using a pulsed power supply. …

Jpn J Appl Phys 52(1), 01AN05-01AN05-4, 2013-01-25

The Japan Society of Applied Physics
2

Synthesis Process of Cobalt Nanoparticles in Liquid-Phase Plasma

Kim Hwan-Gi , Lee Heon , Kim Byung Hoon , Kim Sun-Jae , Lee Ji-Myon , Jung Sang-Chul

… In this work, the liquid phase plasma reduction method was applied to prepare cobalt nanoparticles from the cobalt chloride solution. … The duration of plasma treatment affected not only size and number of produced particles but also the particle shape. …

Jpn J Appl Phys 52(1), 01AN03-01AN03-4, 2013-01-25

The Japan Society of Applied Physics
3

Functionally Gradient Material Ceramics of Hydroxyapatite and Yttria Partially Stabilized Zirconia Prepared by Spark Plasma Sintering for Biocompatibility and Mechanical Strength

Kawagoe Daisuke , Eda Hokuto , Shinohara Akiko , Nakata Satoshi

… Spark plasma sintering (SPS) is a processing technique that makes it possible to prepare materials at low temperatures. …

Jpn J Appl Phys 52(1), 01AM03-01AM03-4, 2013-01-25

The Japan Society of Applied Physics
4

Structural Evolution of Fe Particles in Fe--Al2O3 Granular Films by Ar Ion Irradiations

Nakayama Hiro , Ishida Tomoya , Kinoshita Ryosuke , Purwanto Setyo , Sakamoto Isao , Honda Shigeo , Koike Masaki , Yasumoto Masato , Hayashi Nobuyuki , Toriyama Tamotsu

… Fe--Al2O3 granular films were prepared by helicon plasma sputtering. …

Jpn J Appl Phys 52(1), 01AM01-01AM01-4, 2013-01-25

The Japan Society of Applied Physics
5

Formation and Classification of Amorphous Carbon by Molecular Dynamics Simulation

Ito Atsushi M. , Takayama Arimichi , Saito Seiki , Nakamura Hiroaki

By using molecular dynamics simulation, the formation mechanisms of amorphous carbon in a particular sp3-rich structure were researched. The problem that reactive empirical bond order potential cannot …

Jpn J Appl Phys 52(1), 01AL04-01AL04-7, 2013-01-25

The Japan Society of Applied Physics
6

Structural Change of Single-Crystalline Graphite under Plasma Irradiation

Saito Seiki , Ito Atsushi M. , Takayama Arimichi , Nakamura Hiroaki

… This structural change affects the processes of retention, reflection, and sputtering, which is an interesting issue of plasma-surface-interaction. … Therefore, to investigate the retention of incident hydrogen atoms and the structural change of the graphite under plasma irradiation, hydrogen injection into a single-crystalline graphite is performed by binary-collision-approximation-based (BCA) simulation and the hybrid simulation of BCA and molecular dynamics simulation. …

Jpn J Appl Phys 52(1), 01AL02-01AL02-6, 2013-01-25

The Japan Society of Applied Physics
7

Thermal Treatment of Al2O3, MgO, and CeO2 Granulated Powders by Induction Thermal Plasma: A Numerical Approach

Hossain M. Mofazzal , Alam M. Rafiqul , Watanabe Takayuki

… A plasma--particle interactive flow model has been developed for the investigation of plasma temperature, velocity, particle temperature, diameter, and flight path during in-fight thermal treatment of granulated powders --- Al2O3, MgO, and CeO2 in induction thermal plasma, taking into account of plasma particle interaction and particle loading effects. …

Jpn J Appl Phys 52(1), 01AL01-01AL01-6, 2013-01-25

The Japan Society of Applied Physics
8

Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition

Hiramatsu Mineo , Nihashi Yuki , Kondo Hiroki , Hori Masaru

… Carbon nanowalls (CNWs), a self-organized network of vertically standing few-layer graphenes, were synthesized by inductively coupled plasma-enhanced chemical vapor deposition (ICP-CVD) employing methane and argon mixtures. …

Jpn J Appl Phys 52(1), 01AK05-01AK05-6, 2013-01-25

The Japan Society of Applied Physics
9

Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition

Hiramatsu Mineo , Naito Masateru , Kondo Hiroki , Hori Masaru

… Microwave plasma is one of the high-density plasmas and has been extensively used for the growth of diamond and aligned carbon nanotubes for more than a decade. … However, the conventional microwave plasma of the cylindrical resonant cavity type is not suitable for the synthesis of graphene. …

Jpn J Appl Phys 52(1), 01AK04-01AK04-5, 2013-01-25

The Japan Society of Applied Physics
10

Fabrication of Carbon Nanowalls on Carbon Fiber Paper for Fuel Cell Application

Hiramatsu Mineo , Mitsuguchi Shinji , Horibe Takeyoshi , Kondo Hiroki , Hori Masaru , Kano Hiroyuki

… In order to demonstrate the usefulness of CNWs in fuel cell application, CNWs were directly grown on carbon fiber paper (CFP) using the inductively coupled plasma-enhanced chemical vapor deposition (ICP-CVD) method. …

Jpn J Appl Phys 52(1), 01AK03-01AK03-5, 2013-01-25

The Japan Society of Applied Physics
11

Pulsed Plasma Synthesis of Iron and Nickel Nanoparticles Coated by Carbon for Medical Applications

Abdullaeva Zhypargul , Omurzak Emil , Iwamoto Chihiro , Ihara Hirotaka , Ganapathy Hullathy Subban , Sulaimankulova Saadat , Koinuma Michio , Mashimo Tsutomu

… Fe and Ni magnetic nanoparticles coated by carbon were synthesized between the Fe--Fe and Ni--Ni metal electrodes, submerged in ethanol using pulsed plasma in a liquid method. … In addition, appropriate sizes, good magnetic properties and well-organized graphitic carbon coatings are highlight merits of Fe@C and Ni@C nanoparticles synthesized by pulsed plasma. …

Jpn J Appl Phys 52(1), 01AJ01-01AJ01-4, 2013-01-25

The Japan Society of Applied Physics
12

Influence of Dry Recess Process on Enhancement-Mode GaN Metal--Oxide--Semiconductor Field-Effect Transistors

Wang Qingpeng , Tamai Kentaro , Miyashita Takahiro , Motoyama Shin-ichi , Wang Dejun , Ao Jin-Ping , Ohno Yasuo

… To gain a flat recess profile with uniform etching depth, dry recess experiment with different inductively coupled plasma (ICP) etching conditions was done on an AlGaN/GaN heterostructure. …

Jpn J Appl Phys 52(1), 01AG02-01AG02-5, 2013-01-25

The Japan Society of Applied Physics
13

Damage Analysis of n-GaN Crystal Etched with He and N2 Plasmas

Niibe Masahito , Kotaka Takuya , Kawakami Retsuo , Nakano Yoshitaka , Inaoka Takeshi , Tominaga Kikuo , Mukai Takashi

… To understand the details of etching-induced damage on a GaN surface, n-GaN crystals were plasma-etched with He and N2 gases. … The composition of the surface etched with He plasma changed significantly to being Ga-rich with the N/Ga ratio nearly equaling 0.4--0.5. … The ratio of the surface etched with N2 plasma was about 0.6. …

Jpn J Appl Phys 52(1), 01AF04-01AF04-5, 2013-01-25

The Japan Society of Applied Physics
14

Effects of Sintering Conditions on Mechanical Properties of Biomedical Porous Ti Produced by Spark Plasma Sintering

Hasebe Tatsuya , Kobayashi Equo , Tezuka Hiroyasu , Sato Tatsuo

… In this study, porous Ti were fablicated to decrease the Young's modulus by space holder method from Ti/NaCl composites sintered using spark plasma sintering (SPS) method. …

Jpn J Appl Phys 52(1), 01AE03-01AE03-4, 2013-01-25

The Japan Society of Applied Physics
15

Biointerfacial Property of Plasma-Treated Single-Walled Carbon Nanotube Film Electrodes for Electrochemical Biosensors

Kim Joon Hyub , Lee Jun-Yong , Jin Joon-Hyung , Park Eun Jin , Min Nam Ki

… The single-walled carbon nanotube (SWCNT)-based thin film was spray-coated on the Pt support and functionalized using O2 plasma. … The effects of plasma treatment on the biointerfacial properties of the SWCNT films were analyzed by cyclic voltammogram (CV), electrochemical impedance spectroscopy (EIS), and differential pulse voltammetry (DPV). …

Jpn J Appl Phys 52(1), 01AE02-01AE02-5, 2013-01-25

The Japan Society of Applied Physics
16

Effect of Functional Groups on Biodegradation and Pre-osteoblastic Cell Response on the Plasma-Polymerized Magnesium Surface

Ko Yeong-Mu , Lee Kang , Kim Byung-Hoon

… In this study, the Mg surface was modified by depositing a thin polymeric film containing COOH, NH2, and OH groups through plasma polymerization of acrylic acid, allyl amine, and allyl alcohol in order to improve its anticorrosion and bioactive properties. …

Jpn J Appl Phys 52(1), 01AE01-01AE01-5, 2013-01-25

The Japan Society of Applied Physics
17

Effect of Hydrogen Dilution on the Nanostructural and Electrooptical Characteristics of Hydrogenated Nanocrystalline Silicon Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition

Nam Hee-Jong , Son Jong-Ick , Cho Nam-Hee

… Nanocrystalline hydrogenated amorphous silicon (nc-Si:H) thin films were deposited on silicon wafers and glass by plasma-enhanced chemical vapor deposition. …

Jpn J Appl Phys 52(1), 01AD06-01AD06-7, 2013-01-25

The Japan Society of Applied Physics
18

Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells

Seo Hyunwoong , Wang Yuting , Sato Muneharu , Uchida Giichiro , Kamataki Kunihiro , Itagaki Naho , Koga Kazunori , Shiratani Masaharu

… In this work, Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition, and they were applied to Si QD-sensitized solar cells. …

Jpn J Appl Phys 52(1), 01AD05-01AD05-5, 2013-01-25

The Japan Society of Applied Physics
19

Less Reflective Sub-Wavelength Structure Formed on Textured Surface Using Nanosphere Mask

Lin Chiung-Wei , Juan Cheng-Chieh

… By oxygen plasma hydrophilization and drop-coating processes, we were able to place nanosphere masks on the facet of the textured surface uniformly and then the textured surface was dry-etched into a nanowhisker structure. …

Jpn J Appl Phys 52(1), 01AD03-01AD03-5, 2013-01-25

The Japan Society of Applied Physics
20

High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition

Kim Yeonwon , Hatozaki Kosuke , Hashimoto Yuji , Uchida Giichiro , Kamataki Kunihiro , Itagaki Naho , Seo Hyunwoong , Koga Kazunori , Shiratani Masaharu

… We have carried out in-situ measurements of Si cluster volume fraction in Si films during plasma chemical vapor deposition by using quartz crystal microbalances (QCM's) together with a cluster-eliminating filter. …

Jpn J Appl Phys 52(1), 01AD01-01AD01-4, 2013-01-25

The Japan Society of Applied Physics

Search Results:　 1-20 of 11906

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Search Results:　 1-20 of 11906