Xeを用いたスパッタリングによる大飽和磁化Baフェライト薄膜の作製と磁気特性 [in Japanese] Preparation of Ba Ferrite Films with Large Saturation Magnetization by Xe Sputtering and Magnetic Properties [in Japanese]
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Ba ferrite films were deposited epitaxially on ZnO underlayer from targets with composition of BaO.6.5Fe<SUB>2</SUB>O<SUB>3</SUB> using the facing targets sputtering apparatus. The gas mixture of Ar and Xe at 0.18 Pa and O<SUB>2</SUB> at 0.02 Pa was used as the sputtering gas and the dependences of crystallographic and magnetic characteristics on the partial Xe pressure Pxe (0.0-0.18 Pa) were investigated. Films deposited at various Px5 and at substrate temperature of 600°C were composed of BaM ferrite and spinel crystallites, and the minimum centerline average roughness R<SUB>a</SUB> of 8.9 nm was obtained at Pxe of 0.10 Pa and then the saturation magnetization 4πM<SUB>s</SUB>, of 5.1 kG and perpendicular anisotropy constant Ku1 of 4.23 × 10<SUP>5</SUP> J⋅m<SUP>-3</SUP> were larger than those of bulk BaM ferrite of 4.8 kG and 3.30 × 10<SUP>5</SUP> J⋅m<SUP>-3</SUP>, respectively. C-axis orientation was observed even for the film deposited at low T<SUB>s</SUB> of 475°C and 4πMs, perpendicular and in-plane coercivity, Hc<SUB>⊥</SUB>and H<SUB>c//</SUB>, were 4.7 kG, 2.38 and 0.19 kOe, respectively.
- J. Jpn. Soc. Powder Powder Metallurgy
J. Jpn. Soc. Powder Powder Metallurgy 43(1), 25-30, 1996-01-15
Japan Society of Powder and Powder Metallurgy