書誌事項
- タイトル別名
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- Crystallographic and Magnetic Characteristics of Co-Zn Ferrite Films Deposited by Plasma-free Sputtering Method.
- プラズマ フリー スパッタホウ デ サクセイシタ Co Zn フェライト マク
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抄録
Co-Zn ferrite films were expected for high density magnetic recording media and magnetic thin film devices because of its large magnetocrystalline anisotropy energy and high coercivity. Facing Targets Sputtering (FTS) method was used to deposit Co-Zn ferrite films and the films composed of well (111) oriented crystallites were attained at the substrate temperature T2 below 100°C by using sintered targets with the composition of Co0.51Zn0.45Fe2.04Oy The maximum value of saturation magnetization 4πMs of 4.8 kG was attained at Ts of 250°C and the in-plane and perpendicular coercivities, Hc// and Hc⊥ were around 1.8 kOe, respectively. It was also found that the preferred orientation of Co-Zn ferrite crystallites were strongly dependent on Ts.
収録刊行物
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- 粉体および粉末冶金
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粉体および粉末冶金 43 (1), 46-51, 1996
一般社団法人 粉体粉末冶金協会
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詳細情報 詳細情報について
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- CRID
- 1390001206309363968
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- NII論文ID
- 10002011033
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- NII書誌ID
- AN00222724
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- ISSN
- 18809014
- 05328799
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- NDL書誌ID
- 3918033
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可