プラズマフリー・スパッタ法で作製したCo-Znフェライト膜の結晶性と磁気特性 Crystallographic and Magnetic Characteristics of Co-Zn Ferrite Films Deposited by Plasma-free Sputtering Method
Co-Zn ferrite films were expected for high density magnetic recording media and magnetic thin film devices because of its large magnetocrystalline anisotropy energy and high coercivity. Facing Targets Sputtering (FTS) method was used to deposit Co-Zn ferrite films and the films composed of well (111) oriented crystallites were attained at the substrate temperature T<SUB>2</SUB> below 100°C by using sintered targets with the composition of Co<SUB>0.51</SUB>Zn<SUB>0.45</SUB>Fe<SUB>2.04</SUB>O<SUB>y</SUB> The maximum value of saturation magnetization 4πM<SUB>s</SUB> of 4.8 kG was attained at T<SUB>s</SUB> of 250°C and the in-plane and perpendicular coercivities, H<SUB>c//</SUB> and H<SUB>c⊥</SUB> were around 1.8 kOe, respectively. It was also found that the preferred orientation of Co-Zn ferrite crystallites were strongly dependent on T<SUB>s</SUB>.
粉体および粉末冶金 43(1), 46-51, 1996-01-15
Japan Society of Powder and Powder Metallurgy