プラズマフリー・スパッタ法で作製したCo-Znフェライト膜の結晶性と磁気特性 Crystallographic and Magnetic Characteristics of Co-Zn Ferrite Films Deposited by Plasma-free Sputtering Method

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Co-Zn ferrite films were expected for high density magnetic recording media and magnetic thin film devices because of its large magnetocrystalline anisotropy energy and high coercivity. Facing Targets Sputtering (FTS) method was used to deposit Co-Zn ferrite films and the films composed of well (111) oriented crystallites were attained at the substrate temperature T<SUB>2</SUB> below 100°C by using sintered targets with the composition of Co<SUB>0.51</SUB>Zn<SUB>0.45</SUB>Fe<SUB>2.04</SUB>O<SUB>y</SUB> The maximum value of saturation magnetization 4πM<SUB>s</SUB> of 4.8 kG was attained at T<SUB>s</SUB> of 250°C and the in-plane and perpendicular coercivities, H<SUB>c//</SUB> and H<SUB>c⊥</SUB> were around 1.8 kOe, respectively. It was also found that the preferred orientation of Co-Zn ferrite crystallites were strongly dependent on T<SUB>s</SUB>.

収録刊行物

  • 粉体および粉末冶金  

    粉体および粉末冶金 43(1), 46-51, 1996-01-15 

    Japan Society of Powder and Powder Metallurgy

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各種コード

  • NII論文ID(NAID)
    10002011033
  • NII書誌ID(NCID)
    AN00222724
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05328799
  • NDL 記事登録ID
    3918033
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-274
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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