書誌事項
- タイトル別名
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- Preparation of Iron Nitride with Ion Implantation.
- イオン チュウニュウホウ ニヨル チッカ テツ ノ セイセイ
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抄録
Formation of iron nitrides, especially Fe16N2, was investigated by nitrogen ion implantation for α-Fe sheet. The implanted nitrogen was lost during the process in the high energy implantation because of the thermal instability of iron nitrides. N+ ion implantation with a beam voltage of less than 100keV and its current of less than 5μA was effective for the Fe16N2 formation. Successive annealing in vacuum at 100°C improved its crystallinity. The formation was explicitly detected by XRD for thin film with an incident beam angle of 1 degree. It was also observed on the N+ ion implantated α-Fe(211) preferred oriented thin film with a thickness of about 1μm deposited on capton film by rf-sputter deposition. The presence of Fe16N2 was detected by XRD, but Mossbauer spectroscopy did not show clearly its presence in the as implanted product. Further annealing is necessary to obtain a well crystallized Fe16N2.
収録刊行物
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- 粉体および粉末冶金
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粉体および粉末冶金 43 (1), 95-100, 1996
一般社団法人 粉体粉末冶金協会
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詳細情報
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- CRID
- 1390001206308682880
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- NII論文ID
- 10002011145
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- NII書誌ID
- AN00222724
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- ISSN
- 18809014
- 05328799
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- NDL書誌ID
- 3918041
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可