Reactive Deposition of In_2O_3 Films on In_2O_3 Substrates
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Indium oxide films were reactively deposited on the indium oxide substrates at room temperature. The influence of the substrate on the film structure and the physical properties was studied. The structure of the films was greatly dependent of the freshness of the substrate surface. On the fresh substrates, crystallized films could be deposited, while films were almost amorphous on the air-exposed substrates. The disordered structure of the films was ascribed to contamination of the substrate surface with water vapor. The electrical and optical properties of the films were also described.
- J. Jpn. Soc. Powder Powder Metallurgy
J. Jpn. Soc. Powder Powder Metallurgy 43(7), 930-933, 1996-07-15
Japan Society of Powder and Powder Metallurgy