ECRプラズマスパッタ法によるBa_2NaNb_5O_<15>膜の作製と諸性質 [in Japanese] Preparation of Ba_2NaNb_5O_<15> thin Films by Electron Cyclotron Resonance Plasma Sputter Method and their Properties [in Japanese]
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Ba-Na-Nb-O thin films were formed on sapphire (1120) substrates by electron cyclotron resonance plasma sputtering by using ring shaped targets. A Ba<SUB>2</SUB>NaNb<SUB>5</SUB>O<SUB>15</SUB> (BNN) thin film of single phase was obtained at the substrate temperature of 873 K by using the target composition of Ba : Na : Nb = 1.0 : 1.0 : 5.0. The (001) oriented BNN film was successfully obtained at 923 K. The contents of Ba and Nb in the films were independent of substrate temperature in the range between 298 K and 923 K. However, Na content decreased with increasing substrate temperature. Deposition rates of the BNN thin films were estimated to be about 1.0X10<SUP>-1</SUP> nm/s. The absorption edge of the BNN films deposited at 923 K became clear in the vicinity of 300 nm. The transmittance in the wavelength between 700 and 2000 nm have exceedingly by more than 80%. The refractive index of the film was estimated about 2.07 at 627 nm.
- J. Jpn. Soc. Powder Powder Metallurgy
J. Jpn. Soc. Powder Powder Metallurgy 44(1), 86-89, 1997-01-15
Japan Society of Powder and Powder Metallurgy