ＥＣＲプラズマスパッタ法によるＢａ２ＮａＮｂ５Ｏ１５膜の作製と諸性質

• 渡津 章

  東北大学金属材料研究所

• 増本 博

  東北大学金属材料研究所

• 増田 陽一郎

  八戸工業大学工学部電気工学科

• 馬場 明

  八戸工業大学工学部電気工学科

• 後藤 孝

  東北大学金属材料研究所

• 平井 敏雄

  東北大学金属材料研究所

書誌事項

タイトル別名

• Preparation of Ba2NaNb5O15 thin Films by Electron Cyclotron Resonance Plasma Sputter Method and their Properties.
• ECR プラズマ スパッタホウ ニヨル Ba2NaNb5O15 マク ノ サク

抄録

Ba-Na-Nb-O thin films were formed on sapphire (1120) substrates by electron cyclotron resonance plasma sputtering by using ring shaped targets. A Ba₂NaNb₅O₁₅ (BNN) thin film of single phase was obtained at the substrate temperature of 873 K by using the target composition of Ba : Na : Nb = 1.0 : 1.0 : 5.0. The (001) oriented BNN film was successfully obtained at 923 K. The contents of Ba and Nb in the films were independent of substrate temperature in the range between 298 K and 923 K. However, Na content decreased with increasing substrate temperature. Deposition rates of the BNN thin films were estimated to be about 1.0X10^-1 nm/s. The absorption edge of the BNN films deposited at 923 K became clear in the vicinity of 300 nm. The transmittance in the wavelength between 700 and 2000 nm have exceedingly by more than 80%. The refractive index of the film was estimated about 2.07 at 627 nm.

収録刊行物

• 粉体および粉末冶金

  粉体および粉末冶金 44 (1), 86-89, 1997

  一般社団法人 粉体粉末冶金協会

キーワード

• Electron cyclotron resonance plasma sputtering
• Ba<SUB>2</SUB>NaNb<SUB>5</SUB>O<SUB>15</SUB>
• thin film
• transmittance
• refractive index

詳細情報

• CRID: 1390282681283694592
• NII論文ID: 10002013342
• NII書誌ID: AN00222724
• DOI: 10.2497/jjspm.44.86
• ISSN: 18809014
• ISSN: 05328799
• NDL書誌ID: 4118709
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4118709
• 本文言語コード: ja
• データソース種別:
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