ECRプラズマスパッタ法によるBa_2NaNb_5O_<15>膜の作製と諸性質 Preparation of Ba_2NaNb_5O_<15> thin Films by Electron Cyclotron Resonance Plasma Sputter Method and their Properties

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Ba-Na-Nb-O thin films were formed on sapphire (1120) substrates by electron cyclotron resonance plasma sputtering by using ring shaped targets. A Ba<SUB>2</SUB>NaNb<SUB>5</SUB>O<SUB>15</SUB> (BNN) thin film of single phase was obtained at the substrate temperature of 873 K by using the target composition of Ba : Na : Nb = 1.0 : 1.0 : 5.0. The (001) oriented BNN film was successfully obtained at 923 K. The contents of Ba and Nb in the films were independent of substrate temperature in the range between 298 K and 923 K. However, Na content decreased with increasing substrate temperature. Deposition rates of the BNN thin films were estimated to be about 1.0X10<SUP>-1</SUP> nm/s. The absorption edge of the BNN films deposited at 923 K became clear in the vicinity of 300 nm. The transmittance in the wavelength between 700 and 2000 nm have exceedingly by more than 80%. The refractive index of the film was estimated about 2.07 at 627 nm.

収録刊行物

  • 粉体および粉末冶金  

    粉体および粉末冶金 44(1), 86-89, 1997-01-15 

    Japan Society of Powder and Powder Metallurgy

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各種コード

  • NII論文ID(NAID)
    10002013342
  • NII書誌ID(NCID)
    AN00222724
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05328799
  • NDL 記事登録ID
    4118709
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-274
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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