反応性同時スパッタ法によるFe-Al-N系薄膜の作製とアニール効果 [in Japanese] Reactive Co-sputter Deposition and Successive Annealing of Fe-Al-N Thin Film [in Japanese]
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Reactive rf-sputter deposition was applied on Fe-Al-N ternary thin film deposition. New wurtzite-type solid solution of Al<SUB>1-x</SUB>Fe<SUB>x</SUB>N (x<30atm%) was observed on all as-deposited films. Defect rocked salt-type γ"-FeN coexisted in the films with composition above the solid solution limit. The as-deposited films were paramagnetic. Granular film where α-Fe dispersed in amorphous matrix was obtained by annealing of the films with chemical composition above the solid solution limit in H<SUB>2</SUB> flow at 500°C. They showed soft ferromagnetic behavior. Asdeposited film with composition below the solid solution limit was thermally stable in the annealing at 500°C.
- J. Jpn. Soc. Powder Powder Metallurgy
J. Jpn. Soc. Powder Powder Metallurgy 44(7), 674-677, 1997-07-15
Japan Society of Powder and Powder Metallurgy