Reactive Co-sputter Deposition and Successive Annealing of Fe-Al-N Thin Film.

• Kikkawa Shinichi

  ISIR, Osaka University

• Fujiki Mitsushi

  ISIR, Osaka University

• Takahashi Masao

  ISIR, Osaka University

• Kanamaru Fumikazu

  ISIR, Osaka University

Bibliographic Information

Other Title

• 記録磁性材料　反応性同時スパッタ法によるＦｅ‐Ａ１‐Ｎ系薄膜の作製とアニール効果
• ハンノウセイ ドウジ スパッタホウ ニヨル Fe Al Nケイ ハクマク ノ

Abstract

Reactive rf-sputter deposition was applied on Fe-Al-N ternary thin film deposition. New wurtzite-type solid solution of Al_1-xFe_xN (x<30atm%) was observed on all as-deposited films. Defect rocked salt-type γ"-FeN coexisted in the films with composition above the solid solution limit. The as-deposited films were paramagnetic. Granular film where α-Fe dispersed in amorphous matrix was obtained by annealing of the films with chemical composition above the solid solution limit in H₂ flow at 500°C. They showed soft ferromagnetic behavior. Asdeposited film with composition below the solid solution limit was thermally stable in the annealing at 500°C.

Journal

• Journal of the Japan Society of Powder and Powder Metallurgy

  Journal of the Japan Society of Powder and Powder Metallurgy 44 (7), 674-677, 1997

  Japan Society of Powder and Powder Metallurgy

Keywords

• reactive rf-sputter deposition
• granular film
• wurtzite-type solid solution
• nitride

Details

• CRID: 1390001206307986816
• NII Article ID: 10002014242
• NII Book ID: AN00222724
• DOI: 10.2497/jjspm.44.674
• ISSN: 18809014
• ISSN: 05328799
• NDL BIB ID: 4258101
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4258101
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed