プラズマ窒化における水素の挙動と役割 Behavior and Role of Hydrogen during Plasma Nitriding

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The effect of the gas composition in N<SUB>2</SUB>-H<SUB>2</SUB>, gas mixture plasma on the growth rate of titanium nitride layers was investigated by optical emission spectroscopy (OES), microscopic observation, and X-ray diffractometry. The growth rate of nitride layers was enhanced by hydrogen addition, which was the highest at 50vol.%N<SUB>2</SUB>-50vol.%H<SUB>2</SUB>. The results of the spectroscopic measurements and microscopic observations indicate that NH radical intensity is correlated with the growth rate of nitride layers. It is suggested that NH radical plays the most significant role during nitriding process. XRD analysis shows that the compound layers consists of TiN and Ti<SUB>2</SUB>N. In the diffusion layers, acicular textures were observed by microscopic observation.

収録刊行物

  • 粉体および粉末冶金  

    粉体および粉末冶金 44(7), 712-715, 1997-07-15 

    Japan Society of Powder and Powder Metallurgy

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各種コード

  • NII論文ID(NAID)
    10002014313
  • NII書誌ID(NCID)
    AN00222724
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05328799
  • NDL 記事登録ID
    4258107
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-274
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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