イオンプレーティング法によるセラミックス薄膜に関する研究 A Study on Synthesis of Ceramics Thin Films by Ionplating Method

この論文にアクセスする

この論文をさがす

著者

抄録

This paper review recent research on synthesis of ceramics thin films with ion beam assisted deposition, electron cyclotron resonance plasma sputtering deposition and vacuum arc ion plating deposition method. These deposition method are generally applied to that technique in which deposition and simultaneous ion bombardment of a growing film surface are performed with a low-energy activated particles. The effects of the bombardment during deposition may result in either physical, structural change in the chemical reaction. Examples include improved adhesion, preferred crystal orientation, improved stoichiometry and synthesis of diamond and cubic BN at room temperature. There remain however, important items of study that have not yet received sufficient attention. One may be study in atomic level of these modifications caused by the ion bombardment during the nucleation stage of film growth.

収録刊行物

  • 粉体および粉末冶金  

    粉体および粉末冶金 44(8), 721-728, 1997-08-15 

    Japan Society of Powder and Powder Metallurgy

参考文献:  25件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10002014332
  • NII書誌ID(NCID)
    AN00222724
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05328799
  • NDL 記事登録ID
    4275735
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-274
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ