イオンプレーティング法によるセラミックス薄膜に関する研究 A Study on Synthesis of Ceramics Thin Films by Ionplating Method
This paper review recent research on synthesis of ceramics thin films with ion beam assisted deposition, electron cyclotron resonance plasma sputtering deposition and vacuum arc ion plating deposition method. These deposition method are generally applied to that technique in which deposition and simultaneous ion bombardment of a growing film surface are performed with a low-energy activated particles. The effects of the bombardment during deposition may result in either physical, structural change in the chemical reaction. Examples include improved adhesion, preferred crystal orientation, improved stoichiometry and synthesis of diamond and cubic BN at room temperature. There remain however, important items of study that have not yet received sufficient attention. One may be study in atomic level of these modifications caused by the ion bombardment during the nucleation stage of film growth.
粉体および粉末冶金 44(8), 721-728, 1997-08-15
Japan Society of Powder and Powder Metallurgy