A Study on Synthesis of Ceramics Thin Films by Ionplating Method.
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- Kamijo Eiji
- Dept. Material Chem., Fac. Sci. and Tech., Ryukoku University
Bibliographic Information
- Other Title
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- イオンプレーティング法によるセラミックス薄膜に関する研究
- フンタイ フンマツ ヤキン キョウカイショウ ジュショウ キネン コウエン イ
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Abstract
This paper review recent research on synthesis of ceramics thin films with ion beam assisted deposition, electron cyclotron resonance plasma sputtering deposition and vacuum arc ion plating deposition method. These deposition method are generally applied to that technique in which deposition and simultaneous ion bombardment of a growing film surface are performed with a low-energy activated particles. The effects of the bombardment during deposition may result in either physical, structural change in the chemical reaction. Examples include improved adhesion, preferred crystal orientation, improved stoichiometry and synthesis of diamond and cubic BN at room temperature. There remain however, important items of study that have not yet received sufficient attention. One may be study in atomic level of these modifications caused by the ion bombardment during the nucleation stage of film growth.
Journal
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- Journal of the Japan Society of Powder and Powder Metallurgy
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Journal of the Japan Society of Powder and Powder Metallurgy 44 (8), 721-728, 1997
Japan Society of Powder and Powder Metallurgy
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Details 詳細情報について
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- CRID
- 1390001206308368768
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- NII Article ID
- 10002014332
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- NII Book ID
- AN00222724
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- ISSN
- 18809014
- 05328799
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- NDL BIB ID
- 4275735
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed