高周波スパッタ法によるSi-Fe-N系薄膜の作製および熱分解反応による磁性微粒子の析出 [in Japanese] RF-Sputter Deposition of Si-Fe-N Ternary Thin Films and Their Thermal Annealing for Granular Magnetic Films [in Japanese]
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Amorphous Si-Fe-N thin films were prepared by reaction cosputtering of variable numbers of Si chips on a Fe target with nitrogen sputter gas. They were homogeneous amorphous having both local structures similar to zinc blende type γ′′′-FeN<SUB>0.91</SUB> around Fe atoms and also to Si<SUB>3</SUB>N<SUB>4</SUB> around Si atoms. Fine particles of α-Fe were precipitated to show ferromagnetism by thermal decomposition of γ′′′-FeN<SUB>0.91</SUB> like local structure above 400°C in hydrogen atmosphere. Weaker ferromagnetic component such as Fe<SUB>3</SUB>Si was formed above 600°C. Thermal instability of iron nitride was slightly improved by forming the Si-Fe-N amorphous material.
- J. Jpn. Soc. Powder Powder Metallurgy
J. Jpn. Soc. Powder Powder Metallurgy 45(1), 63-67, 1998-01-15
Japan Society of Powder and Powder Metallurgy