Current Status and Future Prospects of Dry Cleaning Technologies

• ITO Takashi

  (株)富士通研究所

Bibliographic Information

Other Title

• ドライ洗浄の現状と将来展望

Journal

• 空気清浄

  空気清浄 33 (5), 235-240, 1996-01-31

Keywords

• ULSI
• organic contamination
• metal contamination
• native oxide
• photo-excitation
• hydrogen temination

Details

• CRID: 1573668923853792384
• NII Article ID: 10002039410
• NII Book ID: AN00065670
• ISSN: 00235032
• Text Lang: ja
• Data Source:
  • CiNii Articles