Preparation of Cadmium Sulfide Ultrafine Particles Surface-Modified with Thiols in Reverse Micellar Systems and Redispersion in Non-Micellars Solvents.

• Shiojiri Susumu

  Department of Chemical Engineering, Osaka University

• Hirai Takayuki

  Department of Chemical Engineering, Osaka University

• Komasawa Isao

  Department of Chemical Engineering, Osaka University

Bibliographic Information

Other Title

• Preparation of Cadmium Sulfide Ultrafine Particles Surface-Modified with Thiols in Reverse Micellar Systems and Redispersion in Non-Micellar Solvents
• Preparation of Cadmium Sulfide Ultrafin

Abstract

Surface modification with thiols and redispersion into non-micellar solvents of CdS ultrafine particles prepared in situ in reverse micellar systems have been investigated. An excellent redispersion in pyridine is observed when the CdS ultrafine particles are prepared with 0.4 < y (=[S^2–]/[Cd²⁺]) < 0.9 owing to the binding of the added thiophenol molecules to the excess Cd²⁺ ions adsorbed to the surface of the CdS particles. The particle redispersion ratio, R, is defined as the ratio of absorbance of ultrafine particles redispersed in nonmicellar media to that of particles in the same amount of the original reverse micellar solution. As the time after CdS formation until the addition of thiophenol to the micellar solution (t_SH) increases, the redispersion ratio R into either pyridine or CH₂O₂ decreases. The emission at λ_em=570 nm of the formed CdS particles in reverse micellar solutions before adding thiophenol, which has been attributed to surface sulfur vacancies of CdS, also decreases rapidly after the particle formation. This observation suggests that the surface sulfur vacancies of CdS play an important role in the surface modification by thiols. In the redispersion process of CdS ultrafine particles, the added thiophenol molecules are considered to have two functions: destabilizing the reverse micelles and binding to the surface of the particles ejected from the micelles owing to destabilization. Solvent molecules with both ligand parts and hydrophobic groups are favorable for redispersing the particles covered with thiophenol.

Journal

• JOURNAL OF CHEMICAL ENGINEERING OF JAPAN

  JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 30 (1), 86-93, 1997

  The Society of Chemical Engineers, Japan

Keywords

• Reverse Micelle
• Ultrafine Particle
• Cadmium Sulfide
• Surface Modification
• Thiophenol

Details

• CRID: 1390282679542890240
• NII Article ID: 130000020898
• NII Article ID: 10002062192
• NII Book ID: AA00709658
• DOI: 10.1252/jcej.30.86
• COI: 1:CAS:528:DyaK2sXhsVWktLo%3D
• ISSN: 18811299
• ISSN: 00219592
• ISSN: http://id.crossref.org/issn/00219592
• NDL BIB ID: 4163631
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4163631
• Web Site: http://www.jstage.jst.go.jp/article/jcej/30/1/30_1_86/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed