Preparation of Cadmium Sulfide Ultrafine Particles Surface-Modified with Thiols in Reverse Micellar Systems and Redispersion in Non-Micellar Solvents

• Shiojiri Susumu

  Department of Chemical Engineering, Osaka University

• Hirai Takayuki

  Department of Chemical Engineering, Osaka University

• Komasawa Isao

  Department of Chemical Engineering, Osaka University

書誌事項

タイトル別名

• Preparation of Cadmium Sulfide Ultrafine Particles Surface-Modified with Thiols in Reverse Micellar Systems and Redispersion in Non-Micellars Solvents.
• Preparation of Cadmium Sulfide Ultrafin

抄録

Surface modification with thiols and redispersion into non-micellar solvents of CdS ultrafine particles prepared in situ in reverse micellar systems have been investigated. An excellent redispersion in pyridine is observed when the CdS ultrafine particles are prepared with 0.4 < y (=[S^2–]/[Cd²⁺]) < 0.9 owing to the binding of the added thiophenol molecules to the excess Cd²⁺ ions adsorbed to the surface of the CdS particles. The particle redispersion ratio, R, is defined as the ratio of absorbance of ultrafine particles redispersed in nonmicellar media to that of particles in the same amount of the original reverse micellar solution. As the time after CdS formation until the addition of thiophenol to the micellar solution (t_SH) increases, the redispersion ratio R into either pyridine or CH₂O₂ decreases. The emission at λ_em=570 nm of the formed CdS particles in reverse micellar solutions before adding thiophenol, which has been attributed to surface sulfur vacancies of CdS, also decreases rapidly after the particle formation. This observation suggests that the surface sulfur vacancies of CdS play an important role in the surface modification by thiols. In the redispersion process of CdS ultrafine particles, the added thiophenol molecules are considered to have two functions: destabilizing the reverse micelles and binding to the surface of the particles ejected from the micelles owing to destabilization. Solvent molecules with both ligand parts and hydrophobic groups are favorable for redispersing the particles covered with thiophenol.

収録刊行物

• JOURNAL OF CHEMICAL ENGINEERING OF JAPAN

  JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 30 (1), 86-93, 1997

  公益社団法人 化学工学会

キーワード

• Reverse Micelle
• Ultrafine Particle
• Cadmium Sulfide
• Surface Modification
• Thiophenol

詳細情報

• CRID: 1390282679542890240
• NII論文ID: 130000020898
• NII論文ID: 10002062192
• NII書誌ID: AA00709658
• DOI: 10.1252/jcej.30.86
• COI: 1:CAS:528:DyaK2sXhsVWktLo%3D
• ISSN: 18811299
• ISSN: 00219592
• ISSN: http://id.crossref.org/issn/00219592
• NDL書誌ID: 4163631
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4163631
• Web Site: http://www.jstage.jst.go.jp/article/jcej/30/1/30_1_86/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可