Modeling of CVD Coating Inside Agglomerate of Fine Particles

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The coating of ultra-fine particles inside their agglomerates was performed by chemical vapor deposition. Mathematical models are adopted to describe the internal deposition process by chemical reaction and interparticle diffusion, and the porous structural change with the deposition progress. The effects of kinetic, diffusional and agglomerate-geometrical and structural parameters are analyzed for the radial distribution of the deposit. The experimental deposition profiles for the coating of Si<SUB>3</SUB>N<SUB>4</SUB> ultra-fine particles with AlN are quantitatively compared with simulated ones for different reaction temperatures and agglomerate sizes. As a result, uniform deposition of AlN is proven to be obtained at comparatively low temperature with small loosely packed agglomerates.

収録刊行物

  • Journal of chemical engineering of Japan  

    Journal of chemical engineering of Japan 31(1), 103-110, 1998-02 

    The Society of Chemical Engineers, Japan

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各種コード

  • NII論文ID(NAID)
    10002064965
  • NII書誌ID(NCID)
    AA00709658
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    00219592
  • NDL 記事登録ID
    4427708
  • NDL 雑誌分類
    ZP1(科学技術--化学・化学工業)
  • NDL 請求記号
    Z53-R395
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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