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- Golman Boris
- Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
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- Shinohara Kunio
- Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
書誌事項
- タイトル別名
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- Modeling of CVD Coating Inside Agglomer
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抄録
The coating of ultra-fine particles inside their agglomerates was performed by chemical vapor deposition. Mathematical models are adopted to describe the internal deposition process by chemical reaction and interparticle diffusion, and the porous structural change with the deposition progress. The effects of kinetic, diffusional and agglomerate-geometrical and structural parameters are analyzed for the radial distribution of the deposit. The experimental deposition profiles for the coating of Si3N4 ultra-fine particles with AlN are quantitatively compared with simulated ones for different reaction temperatures and agglomerate sizes. As a result, uniform deposition of AlN is proven to be obtained at comparatively low temperature with small loosely packed agglomerates.
収録刊行物
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- JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
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JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 31 (1), 103-110, 1998
公益社団法人 化学工学会
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詳細情報
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- CRID
- 1390282679543049344
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- NII論文ID
- 10002064965
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- NII書誌ID
- AA00709658
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- COI
- 1:CAS:528:DyaK1cXhvV2qs7w%3D
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- ISSN
- 18811299
- 00219592
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- NDL書誌ID
- 4427708
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可