Leaching Behavior and Surface Alteration of Cesium Aluminum Silicate under Static and Dynamic Conditions

この論文にアクセスする

この論文をさがす

著者

抄録

Leach tests have been carried out on solid forms of CsAlSi<SUB>5</SUB>O<SUB>12</SUB> in deionized water under static and dynamic conditions. The normalized mass loss (NL) of Si under static conditions at 90°C increased linearly with leaching time at a ratio of specimen surface area (SA, cm<SUP>2</SUP>) to solution volume (V, cm<SUP>3</SUP>) of 0.1cm<SUP>-1</SUP>, while the leach rate decreased rapidly at SA/V ratios of larger than 0.33cm<SUP>-1</SUP> owing to the saturation of Si in the leachate. In all cases, the NL values of Al were less than 10<SUP>-4</SUP>g/cm<SUP>2</SUP>, and fine particles of aluminum hydroxide precipitated onto the surface at larger than 0.33cm<SUP>-1</SUP>. The leach rate of Cs was larger than that of Si in the early stage within 14d, however, it greatly lowered after 14d. Under dynamic conditions, the NL values of Si and Cs increased linearly with leaching time, yielding normalized leach rates of 6.3×10<SUP>-6</SUP>g/cm<SUP>2</SUP> day for Si and 3.1×10<SUP>-6</SUP>g/cm<SUP>2</SUP> day for Cs, respectively. <BR>Under hydrothermal conditions, the leached amounts of Si and Al increased with temperature up to 300°C, while that of Cs greatly decreased over 200°C. The precipitation of crystalline phases of pollucite (CsAlSi<SUB>2</SUB>O<SUB>6</SUB>) onto the surface resulted in the lowering of Cs concentration in the leachate.

収録刊行物

  • Journal of nuclear science and technology  

    Journal of nuclear science and technology 34(3), 269-276, 1997-03-25 

    Atomic Energy Society of Japan

参考文献:  20件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10002076658
  • NII書誌ID(NCID)
    AA00703720
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    00223131
  • NDL 記事登録ID
    4176279
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A460
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ