Preparation of Thin-Films by Wet Method-Their Structure and Properties. SiO2 Film Deposited by Liquid Phase Deposition Method for Electronic Devices.

• SAKAI Yasuto

  Technical Res. Lab., Nippon Sheet Glass Co., Ltd.

Bibliographic Information

Other Title

• 湿式法による化合物薄膜の作製・構造と物性　　液相析出法（ＬＰＤ法：Ｌｉｑｕｉｄ　Ｐｈａｓｅ　Ｄｅｐｏｓｉｔｉｏｎ）による電子材料の作製
• エキソウ セキシュツホウ LPDホウ Liquid Phase Deposit

Journal

• Journal of The Surface Finishing Society of Japan

  Journal of The Surface Finishing Society of Japan 49 (1), 35-38, 1998

  The Surface Finishing Society of Japan

Keywords

• LPD
• SiO₂
• LCD

Details

• CRID: 1390282679091901440
• NII Article ID: 10002108417
• NII Book ID: AN1005202X
• DOI: 10.4139/sfj.49.35
• COI: 1:CAS:528:DyaK1cXpvVKhtg%3D%3D
• ISSN: 18843409
• ISSN: 09151869
• ISSN: http://id.crossref.org/issn/09151869
• NDL BIB ID: 4367219
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4367219
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles