モード変換型マイクロ波プラズマMOCVD法による(111)配向ZrO_2膜の低温堆積 Low-Temperature(111)Oriented ZrO_2 Film Deposition Using Mode-Converted Micromove Plasma MOCVD

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ZrO<sub>2</sub> films were deposited on 12×17×0.5mm Si(100) single-crystal substrates or 9×18×0.5mm glass substrates using plasma-enhanced metal organic chemical vapor deposition (PE-MOCVD) with Zr (DPM) and oxygen as reactants. A mode converter was used to generate the plasma. The mode converter changes the microwave mode from TE<sub>10</sub> (rectangular) to TM<sub>01</sub> (circular), rising plasma density. We anticipated that ZrO<sub>2</sub> film would be deposited at a lower temperature. The film obtained at 500°C was polycrystalline, but a predominantly (111)-orientated film was obtained at 300°C. Similar results were obtained on Si and glass substrates. No impurity such as hydrocarbon or carbon was detected in films. ZrO<sub>2</sub> films had a tetragonal phase with lattice parameters of a=b=0.507nm and c=0.518nm. ZrO<sub>2</sub> films deposited at 300°C at different microwave powers exhibited the same X-ray diffraction patterns. Film orientation was independent of microwave power. Film deposited for one hour at 300°C was 90nm thick with 30nm roughness and a refractive index of 2.10. Film growth activation energy was 14.5kJ/mol. We concluded that plasma generated by converting microwave to TM<sub>01</sub> mode deposited preferred (111)-oriented ZrO<sub>2</sub> film at a low temperature of 300°C.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 49(3), 287-291, 1998-03-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002108777
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4413781
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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