書誌事項
- タイトル別名
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- Cobalt and Nickel Effects on Electrodeposited Iron-Tungsten-Based Alloy Film Amorphization.
- テツ タングステンケイ ゴウキン メッキ マク ノ ヒショウシツカ ニ オヨボ
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抄録
We used X-ray diffraction to study the effects of cobalt and nickel on electrodeposited iron-tungsten-based alloy film amorphization. The minimum tungsten content required for amorphization decreased from ca 13at% in iron-tungsten binary alloys to ca 4at% or ca 7at% in ternary alloys with cobalt or nickel. A ternary alloy structure with a tungsten content less than that required for amorphization tends to be influenced by the substrate surface structure and to be stable only at low temperature. This appears to be why ternary alloys with cobalt or nickel with lower tungsten content become amorphous than iron-tungsten binary alloy.
収録刊行物
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- 表面技術
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表面技術 49 (3), 305-310, 1998
一般社団法人 表面技術協会
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詳細情報
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- CRID
- 1390001204114939392
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- NII論文ID
- 10002108838
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- NII書誌ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 4413785
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可