表面制御された超はっ水性皮膜のマイクロ波プラズマCVD法による作製 [in Japanese] Ultra Water-repellent Films with Controlled Surfaces Fabricated by Microwave Plasma-enhanced Chemical Vapor Deposition [in Japanese]
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Polymerized organosilicon films containing fluorine were fabricated using microwave plasma-enhanced chemical vapor deposition (MW PECVD). Chemical and physical surface properties were controlled by changing PECVD reaction conditions. Water-repellent films having water contact angles exceeding 150 degrees were obtained at <i>T</i><sub>s</sub>=70°C and total pressure exceeding 40Pa.<br>Films were prepared from a mixed source gas of tetramethylsilane (TMS) or hexamethyldisilane (HMDS), containing no oxygen atoms, and a (heptadecafluoro-1, 1, 2, 2, tetrahydro-decyl)-1-trimethoxysilane (FAS-17). FAS-17 was introduced into a reactor using Ar carrier gas. Water contact angles of these films increased from 115 to 160 degrees as total pressure increased from 25 to 50Pa. Their surface roughnesses increased from <i>R</i><sub>rms</sub>=11.3 to 60.8nm. The film structure became more granular when prepared at a higher pressure. With an increase in the substrate temperature, however, film surfaces became smooth and perfluoro-alkyl groups peeled from films, markedly decreasing in water-contact angles.<br>Films were then prepared from hexamethyldisiloxane (HMDSO), which contains oxygen atoms, and FAS-17 with Ar. <i>R</i><sub>rms</sub> ranged from 10 to 12nm and contact angles remained constant at 110 degrees in the total 25∼50Pa. Oxygen atoms in the source material, i. e., HMDSO, promoted film surface smoothing and reduced water repellency.
- Jitsumu Hyomen Gijutsu
Jitsumu Hyomen Gijutsu 49(4), 385-390, 1998-04-01
The Surface Finishing Society of Japan