Electrochemical Behavior for Electroless-deposition of Co-Fe Alloy on Amorphous Ribbon Substrate.

• MARUYAMA Koh-ichi

  Tokyo Institute of Technology

• MASUDA Mieko

  Kanto Gakuin Univ.

• NUMATA Hiroo

  Tokyo Institute of Technology

• SATO Takashi

  Tokyo Institute of Technology

• OHNO Izumi

  Tokyo Institute of Technology

Bibliographic Information

Other Title

• 非晶質薄帯上への無電解Ｃｏ‐Ｆｅ合金析出の電気化学的特性
• ヒショウシツ ハクタイジョウ エ ノ ムデンカイ Co Fe ゴウキン セキシ

Abstract

Electroless Co-Fe alloy deposition on the substrate of amorphous ribbon in a bath containing DMAB as a reducing agent was studied using an electrochemical polarization curve. The deposition rate was predicted by anodic and cathodic polarization curves for electrolessly-deposited Co-Fe alloy electrodes in the plating bath. The catalytic activity sequence of Co-Fe alloy electrode for anodic oxidation of DMAB was estimated from the current density-potential curve in an anodic partial bath not containing metal ions, and led to clarification of the relationship between the deposition rate of Co-Fe and the alloy composition of the deposit. The catalytic activity sequence of amorphous ribbon electrode depending on its alloy composition for anodic oxidation of DMAB was itself found to significantly affect the deposition rate in the initial stage.

Journal

• Journal of The Surface Finishing Society of Japan

  Journal of The Surface Finishing Society of Japan 49 (6), 618-624, 1998

  The Surface Finishing Society of Japan

Keywords

• Co-Fe Alloy Deposition
• Amorphous Ribbon
• Electrochemical Polarization Curve
• Catalytic Activity
• DMAB

Details

• CRID: 1390282679091264768
• NII Article ID: 10002109610
• NII Book ID: AN1005202X
• DOI: 10.4139/sfj.49.618
• ISSN: 18843409
• ISSN: 09151869
• NDL BIB ID: 4502330
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4502330
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed