高温リン酸によるファインセラミックスのフォトエッチングのためのポリイミドレジスト Polyimide Resist for Photoetching of Fine Ceramics in Hot Phosphoric Acid

この論文にアクセスする

この論文をさがす

著者

抄録

Polyimide film was studied as a resist for ceramic etching in condensed phosphoric acid. Resist films were formed with three different polyimide precursors developed as materials for passivation, insulation, or protective layers on LSIs. After etching alumina ceramic from 260°C to 320°C, we measured changes in resist thickness, resist film breakdown ratio, and etch factors. Resist film chemical resistance depended strongly on the type of polyimide precursor. Photosensitive polyimide, Photoneece UR-3140<sup>®</sup>, showed superior resistance to phosphoric acid at up to 320°C The etch factor was relatively low, around 1, however, regardless of resist film formation conditions, indicating that some further process, e. g., application of an adhesion promoter, was needed to enhance resist adhesion to substrates.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 49(6), 637-642, 1998-06-01

    The Surface Finishing Society of Japan

参考文献:  8件中 1-8件 を表示

  • <no title>

    MAKINO E.

    J. Photo Chemical Machining Institute 27, 4, 1987

    被引用文献2件

  • <no title>

    牧野英司

    精密工学会誌 55(6), 1103, 1989

    被引用文献1件

  • <no title>

    斉木篤

    電子材料 22, 1981

    被引用文献1件

  • <no title>

    平本叔

    電子材料 47, 1981

    被引用文献1件

  • <no title>

    Nikkei New Materials 49, 1986

    被引用文献1件

  • <no title>

    平本叔

    電気学会絶縁材料研究会資料(EIM-84-58) 19, 1984

    被引用文献1件

  • <no title>

    東レ技術

    Toray Photoneece, Photosensitive polyimide coatings for electronics, UR-3100, Bulletin 1-2

    被引用文献1件

  • <no title>

    牧野英司

    表面技術 (7), 1998

    被引用文献1件

各種コード

  • NII論文ID(NAID)
    10002109645
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4502333
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ