マイクロアクチュエータ形成のための形状記憶合金圧延シート材の電解フォトエッチング Electrochemical Photoetching of Rolled Shape Memory Alloy Sheets for Microactuators

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A photoresist-patterned, rolled TiNi (50at% Ti-50at% Ni) sheet 150μm thick was etched electrochemically in 5% H<sub>2</sub>SO<sub>4</sub>/CH<sub>3</sub>OH solution and the effects of applied voltage and pattern width on etch rate and etching accuracy were studied. SEM observation and AES depth analysis revealed that the rolled TiNi specimen had an unetchable surface oxide layer about 3μm thick. The specimen was etched through microcracks in the oxide layer, then distributed throughout the alloy bulk beneath the oxide layer. At an applied voltage exceeding 6V, grooves of different widths were etched uniformly at 0.15μm/s and an etch factor of about 2, independent of groove width. Etched grooves wider than 500μm had a W-shaped profile due to the current flow concentration at the edge of the photoresist mask aperture. At an applied voltage below 5V, uniform etching did not occur at grooves wider than 500μm. We also took a brief look at the oxide removal before etching.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 49(8), 887-893, 1998-08-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002110307
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4546113
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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