金属の析出反応での電気化学的インピーダンスで観察される誘導性挙動の理論的解釈 [in Japanese] Interpretation of Inductive Loop in Electrochemical Impedance during Metal Deposition [in Japanese]
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The origin of inductive behavior in electrochemical impedance during metal deposition was discussed based on numerical analysis. Impedance was calculated by the modulation of adsorption coverage Δθ/Δ<i>E</i> as follows: 1/Z=A<sub>F</sub>+jωC<sub>dl</sub>, A<sub>F</sub>=a<sub>A1</sub>+a<sub>A2</sub> Δθ/ΔE, Δθ/ΔE=aθ1(jωa<sub>θ2</sub>+1), where <i>A</i><sub>F</sub> is admittance, <i>C</i><sub>dl</sub> capacitance of electric double layer, ω angular frequency, and <i>a</i><sub>i</sub> constant. Results of calculation indicate that the following adsorption processes are related to inductive behavior in metal deposition: (i) adsorbed intermediate in consecutive reaction, (ii) cathodic adsorbed species as catalyst, and (iii) anodic adsorbed inhibitor.
- Jitsumu Hyomen Gijutsu
Jitsumu Hyomen Gijutsu 49(8), 900-904, 1998-08-01
The Surface Finishing Society of Japan