金属の析出反応での電気化学的インピーダンスで観察される誘導性挙動の理論的解釈 Interpretation of Inductive Loop in Electrochemical Impedance during Metal Deposition
The origin of inductive behavior in electrochemical impedance during metal deposition was discussed based on numerical analysis. Impedance was calculated by the modulation of adsorption coverage Δθ/Δ<i>E</i> as follows: 1/Z=A<sub>F</sub>+jωC<sub>dl</sub>, A<sub>F</sub>=a<sub>A1</sub>+a<sub>A2</sub> Δθ/ΔE, Δθ/ΔE=aθ1(jωa<sub>θ2</sub>+1), where <i>A</i><sub>F</sub> is admittance, <i>C</i><sub>dl</sub> capacitance of electric double layer, ω angular frequency, and <i>a</i><sub>i</sub> constant. Results of calculation indicate that the following adsorption processes are related to inductive behavior in metal deposition: (i) adsorbed intermediate in consecutive reaction, (ii) cathodic adsorbed species as catalyst, and (iii) anodic adsorbed inhibitor.
- 表面技術 = The Journal of the Surface Finishing Society of Japan
表面技術 = The Journal of the Surface Finishing Society of Japan 49(8), 900-904, 1998-08-01
The Surface Finishing Society of Japan