3価クロムめっき浴からのCr-P-C合金めっき [in Japanese] Electrodeposition of Cr-P-C Alloy Film from Trivalent Chromium Bath [in Japanese]
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Electrodeposition of Cr-P-C alloy film from a trivalent chromium bath containing CrCl<sub>3</sub>, glycine, hypophosphite, and (NH<sub>4</sub>)<sub>2</sub>SO<sub>4</sub> as main components was studied using a double compartment cell separated by a cation exchange membrane. Bright Cr-P-C films with a maximum deposition current efficiency of 10% were obtained from a pH 1.0 bath at a current density of 16A/dm<sup>2</sup>. P content in the film increased to 20at% with increasing hypophosphite concentration in the bath, while C content was about 2at% throughout our plating conditions. X-ray diffraction showed that the as-deposited film was amorphous and crystallized in heat treatment exceeding 600°C, raising film hardness from 500HV to 1500HV.
- Jitsumu Hyomen Gijutsu
Jitsumu Hyomen Gijutsu 49(9), 980-984, 1998-09-01
The Surface Finishing Society of Japan