書誌事項
- タイトル別名
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- Electrodeposition of Cr-P-C Alloy Film from Trivalent Chromium Bath.
- 3カ クロムメッキ ヨク カラ ノ Cr P C ゴウキンメッキ
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抄録
Electrodeposition of Cr-P-C alloy film from a trivalent chromium bath containing CrCl3, glycine, hypophosphite, and (NH4)2SO4 as main components was studied using a double compartment cell separated by a cation exchange membrane. Bright Cr-P-C films with a maximum deposition current efficiency of 10% were obtained from a pH 1.0 bath at a current density of 16A/dm2. P content in the film increased to 20at% with increasing hypophosphite concentration in the bath, while C content was about 2at% throughout our plating conditions. X-ray diffraction showed that the as-deposited film was amorphous and crystallized in heat treatment exceeding 600°C, raising film hardness from 500HV to 1500HV.
収録刊行物
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- 表面技術
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表面技術 49 (9), 980-984, 1998
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679092394240
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- NII論文ID
- 10002110569
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DyaK1cXmtVGitr8%3D
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- ISSN
- 18843409
- 09151869
- http://id.crossref.org/issn/09151869
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- NDL書誌ID
- 4557748
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可