マイクロ波プラズマCVD法による表面酸化処理したクロム基板上でのダイヤモンドの合成 Synthesis of Diamond on Surface Oxidized Chromium Substrates by Microwave Plasma CVD Method
The effects of oxide film on diamond deposition on Cr substrates oxidized at high temperature in air or at room temperature in nitric acid were studied using microwave plasma CVD. Diamond is effectively deposited when oxide film forms on the substrate. Deposited diamond density increased markedly, making diamond film when chemically passive film was formed on the substrate using nitric acid. Surface roughening was also effective in depositing diamond film.
- 表面技術 = The Journal of the Surface Finishing Society of Japan
表面技術 = The Journal of the Surface Finishing Society of Japan 49(11), 1203-1208, 1998-11-01
The Surface Finishing Society of Japan