書誌事項
- タイトル別名
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- Electroless Plalladium Plating from Monoaminodicarboxylic Acid Complex Bath Using Formic Acid as a Reducing Agent.
- ギサン オ カンゲンザイ ト スル モノアミノジカルボンサン サクタイヨク カ
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抄録
An electroless Palladium plating aiming “no emission” were investigated using formic acid as the reducing agent, and monoaminodicarboxylic acid as the complexing agent. Stability constants of Pd2+ complexes are log K1=15, log K2=6 for L-glutamic acid (Glu), and log K1=15, log K2=7 for L-aspartic acid (Asp). The potential-pH equilibrium diagram for Pd2+-Glu (or Asp) and HCOO--HCO3- systems indicates that electroless palladium plating is thermodynamically possible when formic acid is used as the reducing agent. These complex baths exhibited good storage stability, and pure palladium films were deposited autocatalytically. Results of testing for solderability and for electrical contact resistance indicated that electroless pure palladium plating is suitable as an alternative to electrolytic and electroless gold plating of electronic parts.
収録刊行物
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- 表面技術
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表面技術 49 (12), 1322-1326, 1998
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679092445312
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- NII論文ID
- 10002111314
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- NII書誌ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 4624041
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可