無電解ＮｉＢめっきを用いたマイクロパターニングにおける錯化剤の影響

DOI Web Site 被引用文献4件 参考文献13件

書誌事項

タイトル別名
  • Effect of Complexing Agents on Micro-pattern Formation Using Electroless NiB Plating.
  • ムデンカイ NiBメッキ オ モチイタ マイクロパターニング ニ オケル サク

この論文をさがす

抄録

Electroless plating using dimethylamine-borane (DMAB) as a reducing agent showed poor selectivity of deposition on patterned surfaces formed using photoresist. In a basic study on selectivity, we studied the effect of complexing agent on micro-pattern formation using electroless NiB plating. Changing species and concentrations of complexing agents changed the formation of film deposition. We fabricated micro-pattern formation using electroless plating by selecting complexing agents. The combination of glycine and ammonium sulfate was found to be optimal to obtaining deposition with a smooth surface without voids only onto the catalyzed surface. It is thought that selectivity relates to stability of metal complexes rather than deposition rate and/or mixed potential. We found that the high stability of complexing agent yielded high selectivity.

収録刊行物

  • 表面技術

    表面技術 49 (12), 1336-1342, 1998

    一般社団法人 表面技術協会

被引用文献 (4)*注記

もっと見る

参考文献 (13)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ