マイクロ磁気デバイスヘの応用を目的としたFe-Bアモルファス電析膜の作製 [in Japanese] Fabrication of Amorphous Fe-B Electrodeposited Films for Micro-magnetic Devices [in Japanese]
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Amorphous (a-) Fe-B alloy films for micro-magnetic device applications were fabricated by electrodeposition. It was found that an appropriate KBH<sub>4</sub> concentration greater than 300mM and a bath temperature of less than 30°C were indispensable deposition conditions for obtaining a-Fe-B films with a B concentration exceeding 20at%. Furthermore, a-Fe-B films with low coercivity of less than 3.6 Oe and a large magnetostrictive constant of 26×10<sup>-6</sup>, which are thus comparable to sputtered a-Fe-B films, can be obtained by using a combined complex agent consisting of KNaC<sub>4</sub>H<sub>4</sub>O<sub>6</sub> and (NH<sub>4</sub>)<sub>2</sub>SO<sub>4</sub>. ESCA measurements showed that about 80at% boron chemically bound with iron, but about 20at% boron combined with oxygen, because the electrodeposited films contain oxygen and carbon.
- Jitsumu Hyomen Gijutsu
Jitsumu Hyomen Gijutsu 49(12), 1343-1350, 1998-12-01
The Surface Finishing Society of Japan