三磁極マグネトロンスパッタリング法によるNi-Cr合金薄膜の作成 Formation of Ni-Cr Films by Tri-pole Magnetron Sputtering
We studied thin Ni-Cr films deposited by Tripole Magnetron Sputtering (TMS) developed to provide enable composition control of deposited films. Ni-Cr films deposited at a substrate temperature of 200°C showed that their resistivity is influenced by their microstructure, reflected by sputtering conditions, whereas their composition is predominant in their temperature coefficient of resistivity.
- 表面技術 = The Journal of the Surface Finishing Society of Japan
表面技術 = The Journal of the Surface Finishing Society of Japan 50(1), 41-46, 1999-01-01
The Surface Finishing Society of Japan