超音速分子線を用いたArFエキシマレーザー誘起 CVD法による金属光沢薄膜の形成 Fabrication of Metallic Thin Films by ArF Eximer Laser Induced CVD Method Using Supersonic Molecular Beam
ArF eximer-laser-induced chemical vapor deposition (CVD) of coordinated unsaturated species of ironpentacarbonyl on quartz glass was conducted using a supersonic molecular beam. Fabricated thin films turned from black to metallic silver based on the number of laser shots. Ultraviolet absorption spectra from 200 to 350 nm indicated that black thin films were due to induced plasma oscillation in which coordinatied unsaturated ironpentacarbonyl spacies changed to fine metallic particles. For metallic thin films, electron microscopy clarified a meshes structure in which thin films were fabricated proceed through a three-dimensional Volmer-Weber mechanism.
- 表面技術 = The Journal of the Surface Finishing Society of Japan
表面技術 = The Journal of the Surface Finishing Society of Japan 50(1), 95-98, 1999-01-01
The Surface Finishing Society of Japan