超音速分子線を用いたArFエキシマレーザー誘起 CVD法による金属光沢薄膜の形成 Fabrication of Metallic Thin Films by ArF Eximer Laser Induced CVD Method Using Supersonic Molecular Beam

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抄録

ArF eximer-laser-induced chemical vapor deposition (CVD) of coordinated unsaturated species of ironpentacarbonyl on quartz glass was conducted using a supersonic molecular beam. Fabricated thin films turned from black to metallic silver based on the number of laser shots. Ultraviolet absorption spectra from 200 to 350 nm indicated that black thin films were due to induced plasma oscillation in which coordinatied unsaturated ironpentacarbonyl spacies changed to fine metallic particles. For metallic thin films, electron microscopy clarified a meshes structure in which thin films were fabricated proceed through a three-dimensional Volmer-Weber mechanism.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 50(1), 95-98, 1999-01-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002111688
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    NOT
  • ISSN
    09151869
  • NDL 記事登録ID
    973665
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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