高周波誘導型高密度プラズマを用いた純鉄の窒化 Nitriding of Pure Iron In High-density Plasma Using Inductively Coupled Redio Frequency Discharge

この論文にアクセスする

この論文をさがす

著者

抄録

High-density RF induction plasma having a density of 10<sup>13</sup>cm<sup>-3</sup> was generated using 13.56MHz 350W RF power Anticipating the effect of high-density ions, we applied the high-density nitrogen plasma to surface nitriding of iron A nitrided layer consisting of Fe<sub>3</sub>N and Fe<sub>4</sub>N was obtained at 550°C without applying a bias voltage When -200V of bias voltage was applied to the iron substrate, the main product at the surface was Fe<sub>3</sub>N having a higher nitrogen content than Fe<sub>3</sub>N obtained without bias voltage This bias voltage enabled us to nitride the iron surface even at 350°C The Vickers hardness of the surface obtained by conventional low-density plasma at 550°C was 360Hv Using high-density plasma, we obtained 980Hv Vickers hardness increased to 1390Hv when we applied a bias voltage of -100V The maximum hardness, 1410Hv, was obtained at 550°C by applying -200V The Vickers hardness of the surface prepared at 350°C with -200V bias voltage was 970Hv, comparable to that prepared at 550°C with no bias voltage The thickness of the nitriding layer obtained at 550°C with a bias voltage of -200V was 1.9μm, thinner than that obtained by conventional plasma under the same nitriding conditions We concluded that a large amount of nitrogen ion species in the high-density plasma significantly affects iron nitriding, especially surface hardness

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 50(2), 191-195, 1999-02-01

    The Surface Finishing Society of Japan

参考文献:  12件中 1-12件 を表示

  • <no title>

    小沼光晴

    プラズマと成膜の基礎 4-5,189-193, 1986

    被引用文献1件

  • <no title>

    瀧 優介

    素材学会誌 108, 797, 1992

    被引用文献1件

  • <no title>

    佐藤貴康

    表面技術 48, 317, 1997

    被引用文献1件

  • <no title>

    前川英明

    表面技術 44, 17, 1993

    被引用文献1件

  • <no title>

    佐藤貴康

    軽金属学会 42, 650, 1992

    被引用文献1件

  • <no title>

    菅井秀郎

    応用物理 63, 559, 1994

    被引用文献14件

  • <no title>

    HOPWOOD J.

    J. Vac. Sci. Technol. A 11, 147, 1993

    被引用文献5件

  • <no title>

    AMORIM J.

    J. Vac. Sci Technol. B. 9, 362, 1991

    被引用文献1件

  • <no title>

    PARK J. H.

    J. Vac. Sci Technol. B. 14, 478, 1996

    被引用文献1件

  • <no title>

    山中久彦

    イオン窒化法 5, 1976

    被引用文献1件

  • <no title>

    GRILL A.

    Thin Solid Films 101, 219, 1983

    DOI 被引用文献2件

  • <no title>

    KARAMIS M. B.

    Thin Solid Films 217, 38, 1992

    DOI 被引用文献1件

各種コード

  • NII論文ID(NAID)
    10002111870
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4658137
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ