無電解NiB皮膜の結晶構造に及ぼす共析元素の影響 Effect of Co-deposited Elements on Structure of Electroless NiB Plating
The effect of boron and carbon on NiB films deposited from electroless NiB plating bath was studied by differential scanning calorimetry, X-ray diffraction and transmission electron microscope observation.<br>As-deposited NiB films containing boron below ca. 2.5wt%, showed a crystal structure. The structure was not affected by carbon content. As-deposited NiB films with above 2.5wt% B showed a mixed phase with small amounts of fine crystal, an amorphous rich phase at carbon content below 0.25wt%, and a mixed phase with small amounts of amorphous and fine crystal (crystalline-rich phase) at carbon content above 0.3wt%. In films with a boron content above ca. 2.5wt%, codeposited carbon may affect the structure.<br>In crystallization of NiB films containing above ca. 2.5wt% B, the amorphous-rich phase changed to Ni and Ni<sub>3</sub>B crystals, and a very small amount of Ni<sub>3</sub>B was generated into the crystalline-rich phase by heat treatment up to 300°C.
- 表面技術 = The Journal of the Surface Finishing Society of Japan
表面技術 = The Journal of the Surface Finishing Society of Japan 50(4), 353-358, 1999-04-01
The Surface Finishing Society of Japan