無電解NiB皮膜の結晶構造に及ぼす共析元素の影響 Effect of Co-deposited Elements on Structure of Electroless NiB Plating

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The effect of boron and carbon on NiB films deposited from electroless NiB plating bath was studied by differential scanning calorimetry, X-ray diffraction and transmission electron microscope observation.<br>As-deposited NiB films containing boron below ca. 2.5wt%, showed a crystal structure. The structure was not affected by carbon content. As-deposited NiB films with above 2.5wt% B showed a mixed phase with small amounts of fine crystal, an amorphous rich phase at carbon content below 0.25wt%, and a mixed phase with small amounts of amorphous and fine crystal (crystalline-rich phase) at carbon content above 0.3wt%. In films with a boron content above ca. 2.5wt%, codeposited carbon may affect the structure.<br>In crystallization of NiB films containing above ca. 2.5wt% B, the amorphous-rich phase changed to Ni and Ni<sub>3</sub>B crystals, and a very small amount of Ni<sub>3</sub>B was generated into the crystalline-rich phase by heat treatment up to 300°C.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 50(4), 353-358, 1999-04-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002112183
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4707888
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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