書誌事項
- タイトル別名
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- Microstructure of Electrodeposited Co-Ni Alloy Films.
- Co-Ni ゴウキンデンセキマク ノ ビサイ コウゾウ
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抄録
Co-Ni alloy films were potentiostatically deposited on a polycrystalline copper plate and a stainless steel plate from a sulfate bath. In the electrodeposited Co-Ni alloy, an α-phase formed in all compositions and an ε-phase coexisted from 0 to about 40 at% Ni. In the mixed α and ε phase, numerous stacking faults between the ε layers and the α layers occurred within one grain. Film grain size was affected by film composition independent of cathode potential and current density. Substrates crystallinity affected grain size and film surface morphology. Films on the polycrystalline copper plate grew epitaxially and showed a different morphology for the crystal face. Films on the stainless steel grew randomly and showed a ragged surface.
収録刊行物
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- 表面技術
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表面技術 50 (5), 441-447, 1999
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679091285888
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- NII論文ID
- 10002112509
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- NII書誌ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 4725706
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可