Gate Oxide Thinning and Quality Improvement

• ITSUMI Manabu

  NTT LSI Laboratories

Bibliographic Information

Other Title

• ゲート酸化膜の薄層化と高品質化

Journal

• 表面科学

  表面科学 16 (1), 60-64, 1995-01-10

Details

• CRID: 1573950398834518144
• NII Article ID: 10002114793
• NII Book ID: AN00334149
• ISSN: 03885321
• Text Lang: ja
• Data Source:
  • CiNii Articles