A Mask-to-Wafer Fine Gap Setting Method

• KIKUIRI Nobutaka

  Toshiba Research and Development Center, Toshiba Corporation

• NISHIDA Jun

  Toshiba Research and Development Center, Toshiba Corporation

• NISHIZAKA Takeshi

  Toshiba Research and Development Center, Toshiba Corporation

• KUWABARA Osamu

  Toshiba Research and Development Center, Toshiba Corporation

• UCHIDA Norio

  Toshiba Research and Development Center, Toshiba Corporation

収録刊行物

• International journal of the Japan Society for Precision Engineering

  International journal of the Japan Society for Precision Engineering 29 (1), 56-61, 1995-03-31

キーワード

• mask-to-wafer gap setting
• x-ray lithography
• Step & Repeat

詳細情報

• CRID: 1570572699101457408
• NII論文ID: 10002161237
• NII書誌ID: AA1080710X
• ISSN: 0916782X
• 本文言語コード: en
• データソース種別:
  • CiNii Articles