Calibration Method of Optical System Roughness Error for the Random Micro-Roughness Measuring Apparatus

• TAKAYA Yasuhiro

  Osaka University, Department of Mechanical Engineering for Industrial Machinery and Systems Faculty of Engineering

• MIYOSHI Takashi

  Osaka University, Department of Mechanical Engineering for Industrial Machinery and Systems Faculty of Engineering

• ARAI Masatoshi

  TOKYO SEIMITSU CO., LTD.

• HAYASHI Kazushi

  TOKYO SEIMITSU CO., LTD.

• SETAKA Masafumi

  TOKYO SEIMITSU CO., LTD.

Journal

• International journal of the Japan Society for Precision Engineering

  International journal of the Japan Society for Precision Engineering 29 (1), 86-87, 1995-03-31

Keywords

• Fraunhofer diffraction
• micro-roughness
• silicon wafer
• ultrafine polished surface
• optical system roughness error
• in-process measurement

Details

• CRID: 1572824498915143040
• NII Article ID: 10002161268
• NII Book ID: AA1080710X
• ISSN: 0916782X
• Text Lang: en
• Data Source:
  • CiNii Articles