Synchrotron Radiation Stimulated Process. Present Status and Future Prospects.

• URISU Tsuneo

  <I>Institute for Molecular Science, Myodaiji</I>

Bibliographic Information

Other Title

• 放射光励起プロセスの現状と将来展望
• ホウシャコウ レイキ プロセス ノ ゲンジョウ ト ショウライ テンボウ
• Present Status and Future Prospects

Abstract

The synchrotron radiation (SR) stimulated process is a new research field, of which studies started about 13 years ago. Up to now, experiments have been conducted mainly aiming the application to semiconductorprocesses and new material synthesis. In this report, after reviewing recent results of several SR stimulatedprocess experiments such as etching, chemical vapor deposition, epitaxial growth, and site specific processes, an application to the nano structure fabrications-nanometric process-is descrived as a future prospective one.

Journal

• The Review of Laser Engineering

  The Review of Laser Engineering 26 (6), 438-443, 1998

  The Laser Society of Japan

Keywords

• Synchrotron radiation stimulated process
• Etching
• Chemical vapor deposition
• Site specific process
• Nanometric process

Details

• CRID: 1390001204647031168
• NII Article ID: 10002249564
• NII Book ID: AN00255326
• DOI: 10.2184/lsj.26.438
• ISSN: 13496603
• ISSN: 03870200
• NDL BIB ID: 4511846
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4511846
• Web Site: http://www.jstage.jst.go.jp/article/lsj1973/26/6/26_6_438/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed