ギ酸を含む2価クロム電解溶からのクロム電析 Electrodeposition of Chromium from Divalent Chromium Baths Containing Formic Acid

この論文にアクセスする

この論文をさがす

著者

抄録

The electrodeposition of chromium from divalent chromium based baths has not been thoroughly investigated, due to the highly transient and unstable nature of Cr (II) ions. The electrodeposition of chromium from a variety of divalent chromium baths was examined to establish conditions suitable for chromium plating. Divalent chromium baths were prepared by electrolytic reduction of aqueous Cr<sub>2</sub>(SO<sub>4</sub>)<sub>3</sub> solution using a titanium cathode. Lustrous chromium deposition was obtained by electrodeposition at a cathode potential of -1.1V vs SHE, using aqueous 0.8kmol m<sup>-3</sup> CrSO<sub>4</sub> -2.0kmol m<sup>-3</sup> KCl-0.1kmol m<sup>-3</sup> HCOOH (pH 1.8). For 30min of deposition, the average current efficiency for chromium deposition was 25.4%. The average deposit thickness was 10.8μm. The HCOOH concentration suitable for chromium deposition from divalent chromium baths, is much lower than that from trivalent chromium bathes. The main role of the organic acid is to control the pH in the vicinity of the cathode surface.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(3), 245-249, 1996-03 

    The Surface Finishing Society of Japan

参考文献:  7件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10002255877
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    3936738
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ