Electrodeposition of Chromium from Divalent Chromium Baths Containing Formic Acid.
-
- HIRATO Tetsuji
- Dept. of Materials Sci. and Eng., Kyoto Univ.
-
- TERABATAKE Tomomichi
- Graduate Student, Kyoto Univ. Present: Kawasaki Steel Corp.
-
- WATANABE Eiichiro
- Graduate Student, Kyoto Univ. Present: The Science and Technology Agency
-
- AWAKURA Yasuhiro
- Dept. of Materials Sci. and Eng., Kyoto Univ.
Bibliographic Information
- Other Title
-
- ギ酸を含む2価クロム電解浴からのクロム電析
- ギサン オ フクム 2カ クロム デンカイヨク カラ ノ クロム デンセキ
Search this article
Abstract
The electrodeposition of chromium from divalent chromium based baths has not been thoroughly investigated, due to the highly transient and unstable nature of Cr (II) ions. The electrodeposition of chromium from a variety of divalent chromium baths was examined to establish conditions suitable for chromium plating. Divalent chromium baths were prepared by electrolytic reduction of aqueous Cr2(SO4)3 solution using a titanium cathode. Lustrous chromium deposition was obtained by electrodeposition at a cathode potential of -1.1V vs SHE, using aqueous 0.8kmol m-3 CrSO4 -2.0kmol m-3 KCl-0.1kmol m-3 HCOOH (pH 1.8). For 30min of deposition, the average current efficiency for chromium deposition was 25.4%. The average deposit thickness was 10.8μm. The HCOOH concentration suitable for chromium deposition from divalent chromium baths, is much lower than that from trivalent chromium bathes. The main role of the organic acid is to control the pH in the vicinity of the cathode surface.
Journal
-
- Journal of The Surface Finishing Society of Japan
-
Journal of The Surface Finishing Society of Japan 47 (3), 245-249, 1996
The Surface Finishing Society of Japan
- Tweet
Details 詳細情報について
-
- CRID
- 1390282679090465536
-
- NII Article ID
- 10002255877
-
- NII Book ID
- AN1005202X
-
- COI
- 1:CAS:528:DyaK28XhvFCqtb0%3D
-
- ISSN
- 18843409
- 09151869
-
- NDL BIB ID
- 3936738
-
- Text Lang
- ja
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed