イオン窒化とスパッタリングを組み合わせたプラズマ浸硫窒化 Hybrid-Sulfnitriding of Ion-Nitriding and Sputtering

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SCM 435 was plasma-sulfnitrided at 823K for 3.6-18ks in a 30% N<sub>2</sub>-70% H<sub>2</sub> mixing gas atmosphere at 665Pa by hybrid-treating ion-nitriding and sputtering of MoS<sub>2</sub>. MoS<sub>2</sub> was positioned 20mm above the specimen and applied discharge voltages of 300-600V. Sulfnitriding layers formed on the specimen's surface were evaluated by EPMA, X-ray diffraction, microscopic observations and microhardness changes.<br>A 4-μm nitride (γ'-Fe<sub>4</sub>N) layer and a 400-μm nitrogen diffusion layer formed on specimens ion-nitrided without applying an electric potential. A 12-μm compound layer of sulfide (FeS) and nitride (ε-Fe<sub>2-3</sub>N and γ'-Fe<sub>4</sub>N) formed beneath the sulfide, and a 400-μm nitrogen diffusion layer formed on the surface of specimens plasma-sulfnitrided by applying an electric potential of 500V. The compound layer formed in plasma-sulfnitriding was thicker than in ion-nitriding. The compound layer thickness and surface hardness depend on specimen temperature, treatment time and the electric potential applied to MoS<sub>2</sub>. Mo and S were included in plasma-sulfnitrided compound layers. Surface hardness after plasma-sulfnitriding is higher than after conventional sulfnitriding. This may be due to Mo sputtered from the MoS<sub>2</sub> target.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(6), 518-523, 1996-06 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002256552
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    3976395
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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