ダイナミックイオンミキシングによる炭素鋼の低温ほう化処理

DOI Web Site 参考文献11件

書誌事項

タイトル別名
  • Low-Temperature Steel Boronization Through Dynamic Ion Mixing.
  • ダイナミック イオン ミキシング ニヨル タンソ コウ ノ テイオン ホウカ

この論文をさがす

抄録

Mild steel substrates were treated with B-ion implantation or dynamic ion mixing in which B-ion implantation and Ti-deposition were conducted simultaneously. Prior to treatment, some substrates were implanted with C-ions to confirm the location of the original substrate surface. Compositional depth profiles of surface regions were obtained by using Auger electron spectroscopy (AES). For B-ion implantation, implanted B species accumulate with the outward transport of Fe atoms followed by growth of a monolithic B layer. For dynamic ion mixing, this outward Fe-atom transport is enhanced further, apparently due to the trapping of sputtered Fe atoms by condensing Ti atoms on the surface. This Fe-Ti reaction causes Fe atoms to be incorporated into the growing B layer, resulting in the formation of a 3μm-thick boronized layer at less than 200°C.

収録刊行物

  • 表面技術

    表面技術 47 (7), 616-622, 1996

    一般社団法人 表面技術協会

参考文献 (11)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ