ダイナミックイオンミキシングによる炭素鋼の低温硼化処理 Low-Temperature Steel Boronization Through Dynamic Ion Mixing

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抄録

Mild steel substrates were treated with B-ion implantation or dynamic ion mixing in which B-ion implantation and Ti-deposition were conducted simultaneously. Prior to treatment, some substrates were implanted with C-ions to confirm the location of the original substrate surface. Compositional depth profiles of surface regions were obtained by using Auger electron spectroscopy (AES). For B-ion implantation, implanted B species accumulate with the outward transport of Fe atoms followed by growth of a monolithic B layer. For dynamic ion mixing, this outward Fe-atom transport is enhanced further, apparently due to the trapping of sputtered Fe atoms by condensing Ti atoms on the surface. This Fe-Ti reaction causes Fe atoms to be incorporated into the growing B layer, resulting in the formation of a 3μm-thick boronized layer at less than 200°C.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(7), 616-622, 1996-07

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002256799
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    3995262
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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