AIP法によるTi-60at%Hf合金の窒化物薄膜作製と反応性に関する研究 Preparation and Reaction Probability of Nitrogen on Ti-60at% Hf Nitride Film by Arc Ion Plating

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The arc ion plating (AIP) process uses a vacuum arc discharge with which almost all types of ceramic thin film can be formed. In this study, thin films of 40at% Ti-60at% Hf nitride were prepared on WC-Co substrates by AIP. The maximum microhardness obtained was Hv: 4000kgf/mm<sup>2</sup>. The crystal structure and orientation of the formed thin films were analyzed using X-ray diffraction (CuK α, 40kV-30mA). Reduced surface roughness and an increase deposition rate were studies as a function of nitrogen gas pressure.<br>This process can be characterized by the high ionization rate of a metal vapor flux. Few studies have been made, however, on quantitatively assessing gas reactivity in a plasma process. The reaction probability of nitrogen gas in AIP was calculated from the viewpoint of metal-gas reaction kinetics, based on available data such as film deposition and nitrogen impingement rates on the substrate and compositional changes in films. The reaction probability (<i>r</i><sub>N<sub>2</sub></sub>=10<sup>-2</sup>) of nitrogen in Ti<sub>0.4</sub>Hf<sub>0.6</sub>N formation by AIP in this study was found to be equal to that in the hollow cathode discharge (HCD) process and higher than that in the activated reactive evaporation (ARE) by factors of three to ten.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(8), 689-695, 1996-08

    The Surface Finishing Society of Japan

参考文献:  48件中 1-48件 を表示

  • <no title>

    RANDHAWA H.

    J. Vac. Sci. Technol. A4, 2755, 1986

    被引用文献2件

  • <no title>

    DAALDER J. E.

    Physica 104C, 91, 1981

    被引用文献2件

  • <no title>

    HATTO P. W.

    Vacuum 36, 67, 1986

    被引用文献1件

  • <no title>

    ERTURK E.

    Surf. Coat. Technol. 39/40, 435, 1989

    被引用文献1件

  • <no title>

    SANDERS D. M.

    J. Vac. Sci. Technol. A7, 2339, 1987

    被引用文献1件

  • <no title>

    姜求賢

    表面技術 45, 1265, 1994

    被引用文献1件

  • <no title>

    LUNEV V. M.

    Sov. Phys. Tech. Phys. 22, 855, 1978

    被引用文献1件

  • <no title>

    BERGMAN C.

    Surf. Coat. Technol. 36, 243, 1988

    被引用文献1件

  • <no title>

    KOMIYA S.

    J. Vac. Sci. Technol. 14, 1161, 1977

    被引用文献1件

  • <no title>

    BUNSHAN R. F.

    Thin Solid Films 107, 25, 1983

    被引用文献1件

  • <no title>

    FLEISHER W.

    Thin Solid Films 63, 352, 1979

    被引用文献1件

  • <no title>

    MATSUMURA Y.

    Proc. 1st Int. Con. on Plasma Surface Engineering, Garmisch Partenkirchen 45, 1989

    被引用文献1件

  • <no title>

    MATSUMURA Y.

    Surf. Coat. Technol. 60, 489, 1993

    被引用文献1件

  • <no title>

    CHUJO T.

    J. Alloys and Comp. 222, 193, 1995

    被引用文献1件

  • <no title>

    FROMM E.

    Proc. 1st Int. Con. on Plasma Surface Engineering, Garmisch-Parten Kirchen 37, 1989

    被引用文献1件

  • <no title>

    EGUCHI N.

    Surf. Coat. Technol. 49, 127, 1991

    被引用文献1件

  • <no title>

    FROMM E.

    Surf. Sci. 74, 259, 1978

    被引用文献1件

  • <no title>

    UCHIDA H. H.

    Z. Phys. Chem., NF 164, 1123, 1989

    被引用文献1件

  • <no title>

    CHAMBERS C.

    Thin Solid Films 1, 235, 1967

    被引用文献1件

  • <no title>

    STIRLAND D. J.

    Appl. Phys. Letters 8, 326, 1966

    被引用文献1件

  • <no title>

    柏木邦宏

    金属表面技術 35, 32, 1984

    被引用文献3件

  • <no title>

    HISCH E. H.

    Thin Solid Films 69, 99, 1980

    被引用文献1件

  • <no title>

    HOSODA N.

    Z. Phys. Chem., NF 164, 1129, 1989

    被引用文献7件

  • <no title>

    金原粲

    スパッタリング現象 121, 1984

    被引用文献1件

  • <no title>

    SAKAKI M.

    IEEE Trans Plasma Sci. 22, 1049, 1994

    被引用文献1件

  • <no title>

    LUNEV V. M.

    Sov. Phys. Tech. Phys. 22, 858, 1977

    被引用文献2件

  • <no title>

    GODECHOT X.

    IEEE Trans. Plasma Sci. 19, 713, 1991

    被引用文献1件

  • <no title>

    BROWN I. G.

    IEEE Trans. Plasma Sci. 17, 679, 1989

    被引用文献1件

  • <no title>

    SAKAKI M.

    IEEE Trans. Plasma Sci. 19, 25, 1991

    被引用文献1件

  • <no title>

    DEMIDENKO I. I.

    Sov. Phys. Tech. Phys. 29, 895, 1984

    被引用文献1件

  • <no title>

    MARTIN P. J.

    Thin Solid Films 153, 91, 1987

    被引用文献1件

  • <no title>

    SANDERS D. M.

    IEEE Trans. Plasma Sci. 18, 883, 1990

    被引用文献2件

  • <no title>

    日本真空協会関西支部編

    わかりやすい真空技術 第1章, 1990

    被引用文献1件

  • <no title>

    松竹寛康

    表面技術 43, 73, 1992

    被引用文献1件

  • <no title>

    鈴木寿

    日本金属学会誌 49, 773, 1985

    被引用文献5件

  • <no title>

    学術振興会

    薄膜ハンドブック 338, 1983

    被引用文献1件

  • <no title>

    KANG G. H.

    Surf. Coat. Technol. 68/69, 141, 1994

    被引用文献1件

  • <no title>

    山本勉

    日本金属学会誌 49, 120, 1985

    被引用文献1件

  • <no title>

    山本勉

    日本金属学会誌 50, 320, 1986

    被引用文献3件

  • <no title>

    山口隆

    表面技術 41, 509, 1990

    被引用文献1件

  • <no title>

    JINDAL P. C.

    Surf. Coat. Technol. 36, 683, 1988

    被引用文献1件

  • <no title>

    UCHIDA H.

    J. Alloys & Comp. 222, 107, 1995

    被引用文献1件

  • <no title>

    FRELLER H.

    Thin Solid Films 153, 67, 1987

    DOI 被引用文献2件

  • <no title>

    DORODNOV A. M.

    J. Appl. Mech. Tech. Phys. 22, 28, 1981

    DOI 被引用文献1件

  • Analysis of the electrode products emitted by dc arcs in a vacuum ambient

    DAVIS W. D.

    J. Appl. Phys. 40, 2212-2221, 1969

    DOI 被引用文献9件

  • <no title>

    HOFMANN S.

    Thin Solid Films 191, 335, 1990

    DOI 被引用文献4件

  • <no title>

    KANAMORI S.

    Thin Solid Films 136, 195, 1986

    DOI 被引用文献9件

  • <no title>

    WANG D.

    Thin Solid Films 185, 219, 1990

    DOI 被引用文献5件

各種コード

  • NII論文ID(NAID)
    10002256981
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4012577
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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