スパッタリングによるWO_3膜の形成条件とEC特性 Relation between Condition for Preparing WO_3 Film by Sputtering and EC Property

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The relationship between conditions for preparing WO<sub>3</sub> films and their electrochromic properties was investigated.<br>WO<sub>3</sub> thin films were prepared by RF magnetron sputtering with various Ar gas pressures and RF powers.<br>Their optical density, coloring efficiency, and response time for coloration and bleaching were measured in a 0.5M solution of KH<sub>2</sub>PO<sub>4</sub>.<br>The chemical composition, optical gap, and morphology of prepared WO<sub>3</sub> films were measured, and their relationship and electrochromic properties were discussed.<br>The results are as follows:<br>1. The WO<sub>3</sub> film prepared under an Ar gas pressure of 1.0×10<sup>-2</sup>torr or under an RF power of 100-150W showed the best electrochromic properties. This seems closely related to chemical composition and the optical gap of WO<sub>3</sub> films.<br>2. The coloration response time grew slower with increased Ar gas pressure or decreased RF power.<br>The bleaching response time remained virtually unchanged. These characteristics depend on obtaining fine grains and on the nonhomogeneity of the prepared WO<sub>3</sub> films.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(9), 773-778, 1996-09 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002257147
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4028866
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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