無電解析出法による高比抵抗NiP皮膜の作製とその特性 Preparation and It's Properties of High Resistivity NiP Films by Means of Electroless Deposition

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High-resistivity NiP films were prepared by electroless deposition while varying the complexing agent species. When complexing agents having -NH<sub>2</sub> and=NH groups, e. g., amino acids or amines are used for the NiP bath, higher resistivity NiP films are obtained with electroless deposition. Complexing agents of β-alanine, diethylenetriamine, and sodium <i>L</i>-glutamate were most suitable making higher resistivity NiP films. The highest resistivity was obtained from a diethylenetriamine bath. The resistivity of NiP as-deposited film from a diethylenetriamine bath is 5, 400μΩcm, compared to 160μΩcm for usual NiP films. The most suitable NiP film from the diethylenetriamine bath shows resistivity stable against annealing at about 400°C. High specific resistivity films were found to contain a small amount of carbon. The NiP film from the diethylenetriamine bath contained ca. 3at% carbon, and exhibited a grain structure even at the amorphous state.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(9), 779-783, 1996-09 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002257158
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4028867
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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